• Mclaughlin, James
• Okpalugo, T. I. T.
• Ahmad, I.
• Maguire, Paul
• Roy, Susanta Sinha

Abstract

In this work, plasma enhanced chemical vapour deposition was used to prepare hydrogenated amorphous carbon films (a-C:H) on different substrates over a wide range of thickness. In order to observe clear substrate effect the films were produced under identical growth conditions. Raman and near edge X-ray absorption fine structure (NEXAFS) spectroscopies were employed to probe the chemical bonding of the films. For the films deposited on silicon substrates, the Raman ID/IG ratio and G-peak positions were constant for most thickness. For metallic and polymeric substrates, these parameters increased with film thickness, suggesting a change from a sp3-bonded hydrogenated structure to a more sp2 network, NEXAFS results also indicate a higher sp2 content of a-C:H films grown on metals than silicon. The metals, which are poor carbide precursors, gave carbon films with low adhesion, easily delaminated from the substrate. The delamination can be decreased/eliminated by deposition of a thin (∼10 nm) silicon layer on stainless steel substrates prior to a-C:H coatings. Additionally we noted the electrical resistivity decreased with thickness and higher dielectric breakdown strength for a-C:H on silicon substrate.

Topics

• Deposition
• microstructure
• amorphous
• Carbon
• stainless steel
• resistivity
• strength
• carbide
• Silicon
• near-edge X-ray absorption fine structure spectroscopy
• dielectric breakdown strength