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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Martin, Phil
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2020Advanced RuO2 Thin Films for pH Sensing Applicationcitations
- 2018Fabrication of nitrogen-containing diamond-like carbon film by filtered arc deposition as conductive hard-coating filmcitations
- 2018Tuning the Plasmonic Response of TiN Nanoparticles Synthesised by the Transferred Arc Plasma Techniquecitations
- 2018Fabrication of sputtered titanium vanadium nitride (TiVN) thin films for micro-supercapacitorscitations
- 2018Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc depositioncitations
- 2017Biomineralisation with Saos-2 bone cells on TiSiN sputtered Ti alloyscitations
- 2016Fabrication of Semiordered Nanopatterned Diamond-like Carbon and Titania Films for Blood Contacting Applicationscitations
- 2011Mechanical properties and scratch resistance of filtered-arc-deposited titanium oxide thin films on glasscitations
- 2011A review of high throughput and combinatorial electrochemistrycitations
- 2010Multilayered coatings: tuneable protection for metalscitations
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article
Cytocompatible tantalum films on Ti6Al4V substrate by filtered cathodic vacuum arc deposition
Abstract
Tantalum filmswere deposited on negatively biased Ti6Al4V substrates using filtered cathodic vacuum arc deposition to enhance the corrosion resistance of the Ti6Al4V alloy. The effect of substrate voltage bias on the microstructure, mechanical and corrosion properties was examined and the cytocompatibility of the deposited films was verified with mammalian cell culturing. The Ta films deposited with substrate bias of −100 V and −200 V show a mixture of predominantly β phase and minority of α phase. The Ta/−100 V film shows adhesive failure at the Ti/Ta interface and a cohesive fracture is observed in Ta/−200 V film. The Ta/−100 V showed a significant improvement in corrosion resistance, which is attributed to the stable oxide layer. The in-vitro cytocompatibility of the materials was investigated using rat bone mesenchymal stem cells, and the results show that the Ta films have no adverse effect on mammalian cell adhesion and spreading proliferation.