| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Caussat, Brigitte
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (38/38 displayed)
- 2024Fluidized bed chemical vapor deposition of copper on micronic alumina powders
- 2024Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfiberscitations
- 2024Comparative analysis of structural characteristics and thermal insulation properties of ZrO2 thin films deposited via chemical and physical vapor phase processescitations
- 2023Photo-electrocatalytic performance of poly(3,4-ethylenedioxythiophene)/TiO2 nano-tree films deposited by oCVD/CVD for H2 productioncitations
- 2023Corrosion barrier alumina/zirconia bilayer stack on low Cr steel by direct liquid injection metalorganic chemical vapor depositioncitations
- 2023Single-Step PEDOT deposition by oxidative chemical vapor deposition for opto-electronic applications
- 2023Single-Step PEDOT Deposition by oCVD for ITO-Free Deep Blue OLEDscitations
- 2023Single-Step PEDOT Deposition by oCVD for ITO-Free Deep Blue OLEDscitations
- 2023Silicon Oxynitride Coatings Are Very Promising for Inert and Durable Pharmaceutical Glass Vialscitations
- 2023Amorphous Alumina Thin Films Deposited on Carbon Microfibers As Interface Layer for Thermal Oxidation Barrierscitations
- 2021Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiOx) and silicon oxycarbide (SiOxCy) thin filmscitations
- 2021Barrier properties and hydrothermal aging of amorphous alumina coatings applied on pharmaceutical vialscitations
- 2021Liquid antimony pentachloride as oxidant for robust oxidative chemical vapor deposition of Poly(3,4-ethylenedioxythiophene) filmscitations
- 2020An out of the box vision over oxidative chemical vapor deposition of PEDOT involving sublimed iron trichloridecitations
- 2017Synthesis and electrical characterization of monocrystalline nickel nanorods and Ni-CNT composites
- 2017Fluidized bed chemical vapor deposition of copper nanoparticles on multiwalled carbon nanotubescitations
- 2016Mixed diazonium/PEDOT-functionalized graphene electrode for antioxidant biomarkers detection: proof-of-concept for integration on silicon substrate
- 2016Amorphous Alumina Barrier Coatings on Glass: MOCVD Process and Hydrothermal Ageingcitations
- 2015Fluidized-Bed Chemical Vapor Deposition of Silicon on Very Dense Tungsten Powdercitations
- 2015Modeling a MOCVD process to apply alumina films on the inner surface of bottlescitations
- 2015Modeling a MOCVD process to apply alumina films on the inner surface of bottlescitations
- 2015Silicon coating on very dense tungsten particles by fluidized bed CVD for nuclear applicationcitations
- 2015Silicon coating on very dense tungsten particles by fluidized bed CVD for nuclear applicationcitations
- 2015Liquid and Solid Precursor Delivery Systems in Gas Phase Processescitations
- 2015Alumina thin films prepared by direct liquid injection chemical vapor deposition of dimethylaluminum isopropoxide: a process-structure investigationcitations
- 2015Effects of reducing the reactor diameter on the fluidization of a very dense powdercitations
- 2015New insight into carbon nanotubes synthesis from an original Pt/Ti alloy by catalytic chemical vapor deposition
- 2015Process-structure-properties relationship in direct liquid injection chemical vapor deposition of amorphous alumina from aluminum tri-isopropoxidecitations
- 2014Amorphous alumina coatings on glass bottles using direct liquid injection MOCVD for packaging applicationscitations
- 2014Amorphous alumina coatings on glass bottles using direct liquid injection MOCVD for packaging applicationscitations
- 2013Fluidization and coating of very dense powders by fluidized bed chemical vapour deposition.citations
- 2012Silicon nanoparticle/carbon nanotube composites for LI-ION battery anodes
- 2011SUBLIBOX: A Proprietary Solvent Free Method for Intense Vaporization of Solid Compounds
- 2011Alumina coating on dense tungsten powder by fluidized bed metal organic chemical vapour depositioncitations
- 2011Fluidization and coating of very dense powders by Fluidized Bed CVD
- 2011Amorphous alumina coatings: processing, structure and remarkable barrier propertiescitations
- 2006Hydrodynamic study of fine metallic powders in an original spouted bed contactor in view of chemical vapor deposition treatmentscitations
- 2006Principles and applications of CVD powder technologycitations
Places of action
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article
Liquid antimony pentachloride as oxidant for robust oxidative chemical vapor deposition of Poly(3,4-ethylenedioxythiophene) films
Abstract
The oxidative chemical vapor deposition (oCVD) process is investigated to produce Poly (3,4-ethylenedioxythiophene) (PEDOT) thin films on 10 cm diameter Si wafers, involving the SbCl5 liquid oxidant. Process/structure/properties correlations are thoroughly studied, including the influence of the SbCl5/EDOT ratio, substrate temperature (Tsub), total pressure and deposition duration, on the thickness, composition, morphology, spatial uniformity of the films, and on their electrical conductivity and optical transmittance. The electrical conductivity of the films increases by decreasing the oxidant/EDOT ratio and by increasing the substrate temperature. Such increase of substrate temperature results in the decrease of the deposited mass and thickness. Films uniformity and electrical conductivity are improved by decreasing the total pressure. Operating at 75 Pa results in films of equal and uniform thickness deposited on substrates located all over the deposition chamber, proving the potential of the PEDOT-SbCl5 oCVD process to be scaled up over larger surfaces. The absence of post deposition liquid rinsing allows developing a full dry process, which is of interest to coat sensitive substrates and can thus be implemented for the processing of devices requiring durable, transparent, conductive PEDOT thin films, in particular in the field of optoelectronics.