| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Krause, Matthias
Helmholtz-Zentrum Dresden-Rossendorf
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2024Exceptional high-temperature in-air stable solar absorber coatings based on aluminium titanium oxynitride nanocomposites
- 2023Exceptionally high-temperature in-air stability of transparent conductive oxide tantalum-doped tin dioxidecitations
- 2023Advanced characterization and optical simulation for the design of solar selective coatings based on carbon: transition metal carbide nanocomposites
- 2023Design of high-temperature solar-selective coatings based on aluminium titanium oxynitrides AlyTi1−y(OxN1−x). Part 1: Advanced microstructural characterization and optical simulation
- 2023Solar selective coatings based on Carbon:Transition Metal Nanocomposites
- 2022Triboscopic Investigation of Self-Mated Carbon Coatings in Non-Lubricated Friction Conditions
- 2022Low-Friction of ta-C Coatings Paired with Brass and Other Materials under Vacuum and Atmospheric Conditionscitations
- 2021Comprehensive microstructural and optical characterization of the thermal stability of aluminum‑titanium oxynitride thin films after high temperature annealing in air
- 2021Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature
- 2021Impact of low energy ion beams on the properties of rr-P3HT films
- 2021Comprehensive microstructural and optical characterization of the thermal stability of aluminum-titanium oxynitride thin films after high temperature annealing in air
- 2020On the effect of thin film growth mechanisms on the specular reflectance of aluminum thin films deposited via filtered cathodic vacuum arc
- 2020Long‐Term Immobilization in Elderly Females Causes a Specific Pattern of Cortical Bone and Osteocyte Deterioration Different From Postmenopausal Osteoporosiscitations
- 2020Directionality of metal-induced crystallization and layer exchange in amorphous carbon/nickel thin film stackscitations
- 2016Thermally induced formation of metastable nanocomposites in amorphous Cr-Zr-O thin films deposited using reactive ion beam sputteringcitations
- 2016Carbon : nickel nanocomposite templates - predefined stable catalysts for diameter-controlled growth of single-walled carbon nanotubescitations
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article
Impact of low energy ion beams on the properties of rr-P3HT films
Abstract
wo types of ions (fluorine and titanium) are implanted into films of regio-regular poly(3-hexylthiophene-2,5-diyl) (rr-P3HT) spin-coated on glass substrates with subsequent annealing in argon atmosphere to modify their electrical properties and structure. The ion energy and fluence were within 0.2–40 keV and 1013–1015 cm−2 respectively. The dc resistance enhances after the intensive ion beam treatment while the ac impedance decreases. Ti ion implantation with 40 keV energy and 1014 cm−2 fluence induces decrease of the ac impedance by almost two orders of magnitude and appearance of the molecular hydrogen features in 1H NMR spectrum. The UV–VIS spectra of the films are blue shifted after their exposal to the ion beams, which correlates with the presence of oxygen. The ratio of the oxygen to carbon peak intensities (ξ=O1s/C1s) in the XPS spectra is proposed as a measure for the local partial disturbance of the film. EPR spectra demonstrate formation of the paramagnetic states with g factor <2, which is accompanied with the down-field shift of the NMR spectrum. The ion beams are found to have no significant etching effect as per results of the film thickness measurements and AFM images.