| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Arl, Didier
Luxembourg Institute of Science and Technology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2020Controlling electrical and optical properties of zinc oxide thin films grown by thermal atomic layer deposition with oxygen gascitations
- 2020Tuneable Functionalization of Glass Fibre Membranes with ZnO/SnO2 Heterostructures for Photocatalytic Water Treatment: Effect of SnO2 Coverage Rate on the Photocatalytic Degradation of Organicscitations
- 2020Tuneable Functionalization of Glass Fibre Membranes with ZnO/SnO2 Heterostructures for Photocatalytic Water Treatment: Effect of SnO2 Coverage Rate on the Photocatalytic Degradation of Organicscitations
- 2020Tuneable Functionalization of Glass Fibre Membranes with ZnO/SnO(2)Heterostructures for Photocatalytic Water Treatment: Effect of SnO(2)Coverage Rate on the Photocatalytic Degradation of Organicscitations
- 2016Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agentcitations
- 2016One step deposition of PEDOT films by plasma radicals assisted polymerization via chemical vapour depositioncitations
- 2014Tailoring the Properties of Atomic Layer Deposited Nickel and Nickel Carbide Thin Films via Chain-Length Control of the Alcohol Reducing Agentscitations
Places of action
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article
Atomic layer deposition of cobalt carbide films and their magnetic properties using propanol as a reducing agent
Abstract
The investigation of highly conformal thin films using Atomic Layer Deposition (ALD) is driven by a variety of applications in modern technologies. In particular, the emergence of 3D memory device architectures requires conformal materials with tuneable magnetic properties. Here, nanocomposites of carbon, cobalt and cobalt carbide are deposited by ALD using cobalt acetylacetonate with propanol as a reducing agent. Films were grown by varying the ALD deposition parameters including deposition temperature and propanol exposure time. The morphology, the chemical composition and the crystalline structure of the cobalt carbide film were investigated. Vibrating Sample Magnetometer (VSM) measurements revealed magnetic hysteresis loops with a coercivity reaching 500 Oe and a maximal saturation magnetization of 0.9 T with a grain size less than 15 nm. Magnetic properties are shown to be tuneable by adjusting the deposition parameters that significantly affect the microstructure and the composition of the deposited films.