693.932 PEOPLE
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Brault, Pascal
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Topics
Publications (44/44 displayed)
- 2024DC magnetron sputter deposition in pure helium gas: formation of porous films or gas/solid nanocomposite coatings
- 2024Numerical vs Experimental Sputtering Deposition Phase formation prediction in magnetron sputtered Cu(Ti)Zn thin films : Numerical vs Experimental approaches
- 2024The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approachcitations
- 2024The role of sputtered atom and ion energy distribution in films deposited by Physical Vapor Deposition: A molecular dynamics approach
- 2023Zirconium-based nanocatalysts by sputtering onto glycerol and solid carbon
- 2023Microstructural characterization and thermal stability of He charged amorphous silicon films prepared by magnetron sputtering in helium
- 2023Plasma magnetron sputtering using combinatorial approach to deposit complex alloys thin films
- 2023Molecular dynamics approach for the calculation of surface loss probabilities during the growth of C:H films from an argon-methane plasma
- 2023Theory and molecular simulations of plasma sputtering, transport and deposition processescitations
- 2021Binary and ternary Pt-based clusters grown in a plasma multimagnetron-based gas aggregation source: electrocatalytic evaluation towards glycerol oxidationcitations
- 2021On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulationcitations
- 2020Integration of 3D Nanographene into Mesoporous Germaniumcitations
- 2018Plasma sputtering synthesis of nanocatalyst for fuel cells: Experiments and molecular dynamics simulations
- 2015Patterned Nafion membrane for proton exchange membrane fuel cell with ultra-low Pt catalyst loading
- 2015Low-temperature growth processes with helicon radio-frequency plasmas. TiO2 films and Pt/C nano-clusters
- 2015Sputtered Ag thin films with modified morphologies: Influence on wetting propertycitations
- 2014About the key factors driving the resistivity of AuOx thin films grown by reactive magnetron sputteringcitations
- 2014Molecular Dynamics simulations of magnetron (reactive) sputtering and deposition
- 2014Molecular Dynamics simulations of clusters and thin film growth in the context of plasma sputtering deposition
- 2013Energy transferred to the substrate surface during reactive magnetron sputtering of aluminum in Ar/O2 atmospherecitations
- 2013Molecular dynamic simulation of binary ZrxCu100-x metallic glass thin film growth
- 2013IR emission from the target during plasma magnetron sputter depositioncitations
- 2013AlCoCrCuFeNi high entropy alloy cluster growth and annealing on silicon: A classical molecular dynamics simulation study.
- 2013Molecular Dynamics Simulations of plasma sputtering deposition and nanocluster growth on surface.
- 2013Pt nanoclusters prepared by magnetron sputtering and cluster beam deposition for proton exchange membrane fuel cell
- 2013Molecular Dynamics simulations of plasma sputtered ZrxCu1-x amorphous metallic glass thin film growth. Effects of composition and kinetic energy
- 2013One-step synthesis and chemical characterization of Pt C nanowire composites by plasma sputteringcitations
- 2013Ballistic and molecular dynamics simulations of aluminum deposition in micro-trenchescitations
- 2012Cluster organization in co-sputtered carbon-platinum films as revealed by grazing incidence X-ray scatteringcitations
- 2012Molecular dynamics simulations of cluster growth in nanostructured materials
- 2011Plasma sputter deposition of Aluminum onto micropatterned silicon substrates: Experiments and molecular dynamics simulations
- 2011Dependence of hydrophobic properties versus the chemical composition in a AlCoCrCuFeNi high entropy alloy
- 2011High entropy alloys deposited by magnetron sputteringcitations
- 2011Yttria - stabilized zirconia thin films deposited by pulsed-laser deposition and magnetron sputteringcitations
- 2011How the deposition parameters influence the microstructure of metallic alloy thin films deposited by plasma magnetron sputtering?
- 2011PdAu/C catalysts prepared by plasma sputtering for the electro-oxidation of glycerolcitations
- 2011Plasma deposition of catalytic thin films: Experiments, Applications, Molecular modelingcitations
- 2010Complex structure, composition and contact angle relationship in thin films of AlCoCrCuFeNi high entropy alloy and ZrCuAl metallic glass
- 2010Thermal stability of AlCoCrCuFeNi high entropy alloy thin films studied by in-situ XRD analysiscitations
- 2009Complex structure / composition relationship in thin films of AlCoCrCuFeNi high entropy alloycitations
- 2009Magnetron reactive sputtering deposition of oxide films for SOFC application
- 2009Molecular Dynamics for Low Temperature Plasma-Surface Interaction Studiescitations
- 2009Thermal stability and in-situ XRD analysis of AlCoCrCuFeNi high entropy alloy thin films
- 2009Membranes produced by plasma enhanced chemical vapor deposition technique for low temperature fuel cell applicationscitations
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article
About the key factors driving the resistivity of AuOx thin films grown by reactive magnetron sputtering
Abstract
International audience ; Deposition of gold containing oxygen thin films was carried out at room temperature onto silicon substrates by reactive magnetron sputtering under Ar/O2 plasma. Nuclear reaction analysis of films shows that different oxygen concentrations (AuOx with x = 0 to 1.2) can be reached depending on the growth conditions. X-ray diffraction and scanning electron microscopy of the deposited samples evidence nanocrystallised films formed of pure Au phase or of Au metal mixed to a low ordered Au2O3 phase. The films display a columnar growth with grains in the 20-30 nm size range. A higher resistivity than that of pure gold is systematically measured by a four probe method. The electrical resistivity of the films was found to be correlated to the mean oxygen amount, and also to the microstructure of the Au phase.