| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Paven-Thivet, Claire Le
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2014Miniaturized notch antenna based on lanthanum titanium perovskite oxide thin filmscitations
- 2014Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterizationcitations
- 2013Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputteringcitations
- 2012Dielectric oxynitride LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive radio-frequency sputteringcitations
- 2011Perovskite oxynitride LaTiOxNy thin films : Dielectric characterization in low and high frequenciescitations
- 2010Oxynitrides Perovskites Thin Films : Photoelectrochemical Measurement Under Visible Light
- 2009Photoelectrochemical Properties of Crystalline Perovskite Lanthanum Titanium Oxynitride Films under Visible Light.citations
- 2008Structural and dielectric properties of oxynitride perovskite LaTiOxNy thin filmscitations
- 2007Oxynitride perovskite LaTiO<sub>x</sub>N<sub>y</sub> thin films deposited by reactive sputteringcitations
Places of action
| Organizations | Location | People |
|---|
article
Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputtering
Abstract
Perovskite La Ti O N thin films have been grown by radio frequency magnetron sputtering from a LaTiO2N target. With a very low base pressure in the deposition chamber, two types of films can be obtained: colored oxynitride LaTiO2N films when nitrogen gas is introduced during sputtering or black N-doped LaTiO3 films when deposition is performed in pure argon. On SrTiO3 (0 0 1) substrate heated at 750 ◦C, LaTiO2N films are epitaxially grown, while N:LaTiO3 films are poorly crystallized. With a higher base pressure in the deposition chamber, transparent La2Ti2O7 films are produced. They are (0 1 2) textured on (0 0 1) SrTiO3 substrate. As observed during the reactive sputtering of metallic targets, the evolution of the deposition rate and the nitrogen content in films according to the N2 percentage in the plasma is abrupt.