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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Lu, Yu
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (17/17 displayed)
- 2022The influence of thermal oxidation on the microstructure, fatigue properties, tribological and in vitro behaviour of laser powder bed fusion manufactured Ti-34 Nb-13Ta-5Zr-0.2O alloycitations
- 2022Nucleation and growth of molybdenum disulfide grown by thermal atomic layer deposition on metal oxidescitations
- 2019Modelling of the heat-affected and thermomechanically affected zones in a Ti-6Al-4V inertia friction weldcitations
- 2014La2Ti2O7 perovskite compound: from thin film deposition to notch antenna miniaturization
- 2014Miniaturized notch antenna based on lanthanum titanium perovskite oxide thin filmscitations
- 2014Miniaturized notch antenna based on lanthanum titanium perovskite oxide thin filmscitations
- 2014Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterizationcitations
- 2014Lanthanum titanium perovskite compound: Thin film deposition and high frequency dielectric characterizationcitations
- 2014Functional dielectric oxide and oxynitride perovskite thin films deposited by reactive magnetron sputtering
- 2013Reactive Sputtering Deposition of Perovskite Oxide and Oxynitride Lanthanum Titanium Films: Structural and Dielectric Characterizationcitations
- 2013Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputteringcitations
- 2013Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputteringcitations
- 2013A new lanthanum titanium oxide perovskite compound: thin film deposition and dielectric characterization.
- 2013Functional dielectric oxide and oxynitride compounds in the perovskite La-Ti-O-N system: from thin film sputtering deposition to dielectric characterization
- 2012Processing, crystallization behavior and dielectric performance of perovskite LaTiO x N y thin films
- 2011Perovskite oxynitride LaTiOxNy thin films : Dielectric characterization in low and high frequenciescitations
- 2011Perovskite oxynitride LaTiOxNy thin films : Dielectric characterization in low and high frequenciescitations
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article
Influence of the sputtering reactive gas on the oxide and oxynitride LaTiON deposition by RF magnetron sputtering
Abstract
Perovskite La Ti O N thin films have been grown by radio frequency magnetron sputtering from a LaTiO2N target. With a very low base pressure in the deposition chamber, two types of films can be obtained: colored oxynitride LaTiO2N films when nitrogen gas is introduced during sputtering or black N-doped LaTiO3 films when deposition is performed in pure argon. On SrTiO3 (0 0 1) substrate heated at 750 ◦C, LaTiO2N films are epitaxially grown, while N:LaTiO3 films are poorly crystallized. With a higher base pressure in the deposition chamber, transparent La2Ti2O7 films are produced. They are (0 1 2) textured on (0 0 1) SrTiO3 substrate. As observed during the reactive sputtering of metallic targets, the evolution of the deposition rate and the nitrogen content in films according to the N2 percentage in the plasma is abrupt.