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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Ayouchi, R.
Laboratoire Analyse, Géométrie et Applications
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2014Tungsten trioxide nanostructured electrodes for organic dye sensitised solar cellscitations
- 2013Optical properties of lead-free NKN films from transmission and spectral ellipsometrycitations
- 2012Complex dielectric function in lead-free NKN filmscitations
- 2012Transfer characteristic of zinc nitride based thin film transistorscitations
- 2012Development of lead-free materials for piezoelectric energy harvestingcitations
- 2012Secondary electron emission yield (SEY) in amorphous and graphitic carbon films prepared by PLDcitations
- 2010Local electromechanical properties of ZnO thin films and microcrystals
- 2010Optical properties of TiO(2) thin films prepared by chemical spray pyrolysis from aqueous solutionscitations
- 2010Local piezoelectric properties of ZnO thin films prepared by RF-plasma-assisted pulsed-laser deposition methodcitations
- 2010RF-plasma assisted PLD growth of Zn3N2 thin filmscitations
- 2009Morphological and optical properties of silicon thin films by PLDcitations
- 2008Study of trap states in zinc oxide (ZnO) thin films for electronic applicationscitations
- 2007ZnO films grown by laser ablation with and without oxygen CVDcitations
- 2007Photoinduced excess carrier dynamics in PLD-grown ZnOcitations
- 2001Electrochemical properties of lead oxide films obtained by spray pyrolysis as negative electrodes for lithium secondary batteriescitations
- 2000Compositional, structural and electrical characterization of barium titanate thin films prepared on fused silica and Si(111) by spray pyrolysis
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article
Morphological and optical properties of silicon thin films by PLD
Abstract
Silicon thin films have been prepared on sapphire substrates by pulsed laser deposition (PLD) technique. The films were deposited in vacuum from a silicon target at a base pressure of 10 (-6) mbar in the temperature range from 400 to 800 degrees C. A Q-switched Nd:YAG laser (1064 nm, 5 ns duration, 10 Hz) at a constant energy density of 2 J x cm (-2) has been used. The influence of the substrate temperature on the structural, morphological and optical properties of the Si thin films was investigated. Spectral ellipsometry and atomic force microscopy (AFM) were used to study the thickness and the surface roughness of the deposited films. Surface roughness values measured by AFM and ellipsometry show the same tendency of increasing roughness with increased deposition temperature.