| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Zalesak, Jakub
University of Salzburg
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2024Backside metallization affects residual stress and bending strength of the recast layer in laser-diced Sicitations
- 2023W18O49 Nanowhiskers Decorating SiO2 Nanofiberscitations
- 2023Encapsulation of Uranium Oxide in Multiwall WS<sub>2</sub> Nanotubes
- 2023Mapping strain across Co80Ta7B13 / Co62Ta6B32 glassy interfaces
- 2023Probing the composition dependence of residual stress distribution in tungsten-titanium nanocrystalline thin filmscitations
- 2022Precipitation-based grain boundary design alters Inter- to Trans-granular Fracture in AlCrN Thin Filmscitations
- 2022Microstructure-dependent phase stability and precipitation kinetics in equiatomic CrMnFeCoNi high-entropy alloy: Role of grain boundariescitations
- 2021Powder Diffraction Data of Aluminum-Rich FCC-Ti1-xAlxN Prepared by CVDcitations
- 2020Nanoscale stress distributions and microstructural changes at scratch track cross-sections of a deformed brittle-ductile CrN-Cr bilayercitations
- 2020Evolution of stress fields during crack growth and arrest in a brittle-ductile CrN-Cr clamped-cantilever analysed by X-ray nanodiffraction and modellingcitations
- 2019Anisotropy of fracture toughness in nanostructured ceramics controlled by grain boundary designcitations
- 201830 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin filmcitations
- 2017Peculiarity of self-assembled cubic nanolamellae in the TiN/AlN systemcitations
- 2016Combinatorial refinement of thin-film microstructure, properties and process conditions: iterative nanoscale search for self-assembled TiAlN nanolamellaecitations
Places of action
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article
Peculiarity of self-assembled cubic nanolamellae in the TiN/AlN system
Abstract
Synthesis of self-assembled thin films with multi-layered microstructures and outstanding functional properties represents a challenging task. In this work, detailed microstructural and chemical analyses of a self-assembled ∼3.8 μm thick cubic (c) (AlxTi1-x)yN1-y film grown by low pressure chemical vapour deposition on a Al2O3(0001) substrate is discussed. The film with an overall x fraction of ∼0.8 consists of alternating non-stoichiometric cubic Al-rich and Ti-rich nanolamellae with thicknesses of ∼11 and ∼1.5 nm. X-ray diffraction, electron microscopy and electron energy loss spectroscopy indicate that the nanolamellae coherency is primarily a result of an N deficiency in Ti-rich nanolamellae and an N excess in Al-rich nanolamellae, which induce a decrease and an increase in nanolamellae lattice parameters, compared to the lattice parameters of stoichiometric rock-salt c-TiN and c-AlN, respectively. Therefore the self-assembly allows a formation of c-(AlxTi1-x)yN1-y nanolamellae with Al atomic fraction x of 0.9–1.0, which are stabilized by neighbouring Ti-rich nanolamellae as a result of cube-on-cube epitaxy. The effect of the lattice parameter self-adjustment in the coherent nanolamellae by element deficiency and excess is verified by ab initio calculations. The compositional and morphological matches of the nanolamellae interfaces at the grain boundaries, the terraced growth with tetrahedral surface morphology and unzipped facets as well as the uniform nanolamellae thickness across the film depth indicate that the nanolamellae are formed as a result of kinetically-controlled oscillating reactions during the film growth. The understanding of this fascinating self-assembled nanolamellar microstructure containing a meta-stable c-AlNy, which does not exist in a bulk form at ambient conditions, represents a milestone in thin film technology.