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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Subramanian, Balasubramanian
in Cooperation with on an Cooperation-Score of 37%
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Publications (6/6 displayed)
- 2018Fabrication of sputtered titanium vanadium nitride (TiVN) thin films for micro-supercapacitorscitations
- 2017Antimicrobial Characteristics of Pulsed Laser Deposited Metal Oxides on Polypropylene Hydroentangled Nonwovens for Medical Textilescitations
- 2017AC, DC conduction and dielectric behaviour of solid and liquid phase sintered Al2O3-15 mol% V2O5 pelletscitations
- 2017Biomineralisation with Saos-2 bone cells on TiSiN sputtered Ti alloyscitations
- 2016Apatite layer growth on glassy Zr48Cu36Al8Ag8 sputtered titanium for potential biomedical applicationscitations
- 2016Nanostructured TiCrN thin films by Pulsed Magnetron Sputtering for cutting tool applicationscitations
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article
Fabrication of sputtered titanium vanadium nitride (TiVN) thin films for micro-supercapacitors
Abstract
In the present work, we have demonstrated the micro-supercapacitor behavior of titanium vanadium nitride thin films fabricated on stainless steel substrates by a pulsed DC magnetron sputtering technique. The microstructural characterization from X-ray diffraction (XRD) reveals the FCC structure of TiVN thin films with a preferred (200) orientation. A faceted morphology with square-edge shaped dense grains of the thin films is observed from field emission scanning electron microscopy (FESEM) and transmission electron microscopy (TEM) images. Ion scattering spectroscopy (ISS) and X-ray photoelectron spectroscopy (XPS) was used to determine the surface compositions and confirmed the absence of impurities. The specific capacitance (Csp) of the electrode material was evaluated by cyclic voltammetry (CV). Galvanostatic charge–discharge (CD) test and the electrochemical impedance spectroscopy (EIS) measurements were also performed. The electrochemical result of fabricated TiVN displays a supercapacitive behavior. A maximum Csp of 69 F/g (volumetric capacitance of 155.94 F/cm3) is obtained from both CV and CD studies. The experimental results reveal that the sputtered TiVN thin films area promising electrode material for electrochemical micro-supercapacitors.