| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Zazpe, Raul
Central European Institute of Technology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2024Low‐Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitorscitations
- 2021Protection of hematite photoelectrodes by ALD-TiO2 capping ; Ochrana hematitových elektrod pomocí krycích TiO2 vrstev vytvořených ALDcitations
- 2021Atomic layer deposition of photoelectrocatalytic material on 3D-printed nanocarbon structures ; Depozice atomárních vrstev fotoelektrokatalytického materiálu na 3D tištěné uhlíkové nanostruktury.citations
- 2020ALD SnO2 coated anodic 1D TiO2 nanotube layers for low concentration NO2 sensingcitations
- 2020Atomic Layer Deposition of MoSe2 Using New Selenium Precursors ; Depozice atomárních vrstev MoSe2 s použitím nových selenových prekurzorůcitations
- 2020Atomic Layer Deposition of MoSe2 Using New Selenium Precursorscitations
- 2017ALD Al2O3-Coated TiO2 Nanotube Layers as Anodes for Lithium-Ion Batteriescitations
Places of action
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article
Low‐Temperature Atomic Layer Deposition Synthesis of Vanadium Sulfide (Ultra)Thin Films for Nanotubular Supercapacitors
Abstract
<jats:p>Herein, the synthesis of vanadium sulfide (V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub>) by atomic layer deposition (ALD) based on the use of tetrakis(dimethylamino) vanadium (IV) and hydrogen sulfide is presented for the first time. The (ultra)thin films V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> are synthesized in a wide range of temperatures (100–225 °C) and extensively characterized by different methods. The chemical composition of the V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> (ultra)thin films reveals different vanadium oxidation states and sulfur‐based species. Extensive X‐ray photoelectron spectroscopy analysis studies the effect of different ALD parameters on the V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> chemical composition. Encouraged by the rich chemistry properties of vanadium‐based compounds and based on the variable valences of vanadium, the electrochemical properties of ALD V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> (ultra)thin films as electrode material for supercapacitors are further explored. Thereby, nanotubular composites are fabricated by coating TiO<jats:sub>2</jats:sub> nanotube layers (TNTs) with different numbers of V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> ALD cycles at low temperature (100 °C). Long‐term cycling tests reveal a gradual decline of electrochemical performance due to the progressive V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub> thin films dissolution under the experimental conditions. Nevertheless, V<jats:sub><jats:italic>x</jats:italic></jats:sub>S<jats:sub><jats:italic>y</jats:italic></jats:sub>‐coated TNTs exhibit significantly superior capacitance properties as compared to the blank counterparts. The enhanced capacitance properties exhibited are derived from the presence of chemically stable and electrochemically active S‐based species on the TNTs surface.</jats:p>