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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Bartholazzi, Gabriel
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article
Novel Interlayer Boosting the Performance of Evaporated Cu2O Hole-Selective Contacts in Si Solar Cells
Abstract
<p>Passivating contacts based on transition metal oxides are of great interest for applications in crystalline silicon (c-Si) solar cells due to their improved optical transparency and potential cost reduction. In this work, the contact resistivity and passivation for thermally evaporated Cu<sub>2</sub>O are investigated and optimized, with and without an Al<sub>2</sub>O<sub>3</sub> interlayer, as a hole-selective contact to c-Si. Additionally, we implement an Al<sub>y</sub>TiO<sub>x</sub>/TiO<sub>2</sub> stack as a novel passivating tunnel interlayer for hole-selective contacts, achieving an implied open-circuit voltage iV <sub>oc</sub> of 630 mV and a record-low J <sub>0</sub> of 212 fA cm<sup>−2</sup> while maintaining a contact resistivity ρ <sub>c</sub> of 62 mΩ cm<sup>2</sup>. A record-low ρ <sub>c</sub> of 8 mΩ cm<sup>2</sup> for Cu<sub>2</sub>O-based contacts is also demonstrated at the expense of passivation. The addition of the interlayer resulted in a 2% absolute improvement in the efficiency of proof-of-concept c-Si cells with full-area rear Cu<sub>2</sub>O contacts, reaching 19.1%.The demonstration of this novel interlayer stack provides new avenues to improve the performance also of other hole-selective passivating contacts.</p>