| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Bose, Sourav
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (11/11 displayed)
- 2023Structural, optical and electrical properties of single-phase wurtzite ZnMgAlO thin films deposited by ultrasonic spray pyrolysiscitations
- 2022Development and Study of Earth-Abundant Oxide Based Thin Films for Solar Cells by Ultrasonic Spray Pyrolysis : From Unbeknownst to Erudite Processes ; Élaboration et étude de couches minces à base d'oxydes d'éléments abondants pour le photovoltaïque par spray pyrolyse ultrasonique
- 2021Ultrasonic spray pyrolysis deposition of cuprous oxide thin films: Microstructure and optical investigations
- 2021Effect of the precursor concentration on structural properties of ZnO thin films by ultrasonic spray pyrolysis
- 2021Elaboration of high-transparency ZnO thin films by ultrasonic spray pyrolysis with fast growth ratecitations
- 2020Optical Lithography Patterning of SiO 2 Layers for Interface Passivation of Thin Film Solar Cellscitations
- 2020Development of InGaN based solar cells: present status and challenges
- 2020Development of InGaN based solar cells: present status and challenges
- 2019Rear Optical Reflection and Passivation Using a Nanopatterned Metal/Dielectric Structure in Thin-Film Solar Cellscitations
- 2018Optical Lithography Patterning of SiO<sub>2</sub> Layers for Interface Passivation of Thin Film Solar Cellscitations
- 2018Optical Lithography Patterning of SiO2 Layers for Interface Passivation of Thin Film Solar Cellscitations
Places of action
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article
Optical Lithography Patterning of SiO<sub>2</sub> Layers for Interface Passivation of Thin Film Solar Cells
Abstract
<jats:sec><jats:label /><jats:p>Ultrathin Cu(In,Ga)Se<jats:sub>2</jats:sub> solar cells are a promising way to reduce costs and to increase the electrical performance of thin film solar cells. An optical lithography process that can produce sub‐micrometer contacts in a SiO<jats:sub>2</jats:sub> passivation layer at the CIGS rear contact is developed in this work. Furthermore, an optimization of the patterning dimensions reveals constrains over the features sizes. High passivation areas of the rear contact are needed to passivate the CIGS interface so that high performing solar cells can be obtained. However, these dimensions should not be achieved by using long distances between the contacts as they lead to poor electrical performance due to poor carrier extraction. This study expands the choice of passivation materials already known for ultrathin solar cells and its fabrication techniques.</jats:p></jats:sec>