| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Preece, Jon
University of Birmingham
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023Nanoparticle formulation for intra-articular treatment of osteoarthritic jointscitations
- 2013Structure and mechanical properties of consumer-friendly PMMA microcapsulescitations
- 2012Failure of elastic-plastic core-shell microcapsules under compressioncitations
- 2011TEM characterization of chemically synthesized copper-gold nanoparticlescitations
- 2009Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Filmscitations
- 2009pH-dependent adsorption of Au nanoparticles on chemically modified Si3N4 MEMS devicescitations
- 2008Electrospinning nanosuspensions loaded with passivated Au nanoparticlescitations
- 2007Suppression of pinhole defects in fullerene molecular electron beam resistscitations
- 2002HREELS studies of gold nanoparticles with dialkyl sulphide ligandscitations
Places of action
| Organizations | Location | People |
|---|
article
Direct Electron-Beam Writing of Highly Conductive Wires in Functionalized Fullerene Films
Abstract
This work demonstrates the patterning of thin films ( approximately 25 nm) of a newly synthesized fullerene derivative by direct-write electron-beam lithography to produce highly conducting carbon microstructures. Scanning electron microscopy and atomic force microscopy are used to characterize the resulting microstructure morphology, whilst the resistivities of the structures are probed using four-point probe electrodes deposited on the microstructures by lift-off. The microstructures have a resistivity of approximately 9.5 x 10(-3) Omega cm after exposure to an electron dose of 0.1 C cm(-2). The method may have applications in the generation and electrical contacting of organic electronics, organic photovoltaics, and lab-on-a-chip devices.