| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Murdoch, Billy
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Publications (4/4 displayed)
- 2023Targeting telomerase utilizing zeolitic imidazole frameworks as non-viral gene delivery agents across different cancer cell typescitations
- 2023Quantitative depth‐dependent analysis using the inelastic scattering backgrounds from X‐ray photoelectron spectroscopy and hard X‐ray photoelectron spectroscopycitations
- 2019Voltage Controlled Hot Carrier Injection Enables Ohmic Contacts Using Au Island Metal Films on Gecitations
- 2017Voltage Controlled Hot Carrier Injection Enables Ohmic Contacts Using Au Island Metal Films on Gecitations
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article
Quantitative depth‐dependent analysis using the inelastic scattering backgrounds from X‐ray photoelectron spectroscopy and hard X‐ray photoelectron spectroscopy
Abstract
<jats:p>The inelastic scattering contribution to an X‐ray photoelectron spectrum (XPS) reflects the distribution of elements within the sample depth. Varying the energy of the incident photons changes the inelastic scattering contribution. We present a standardless, automated method that exploits this change to enable compositional analysis within the XPS information depth (also known as amount of substance, <jats:italic>AOS</jats:italic><jats:sub>3λ</jats:sub>). In this method, the photoelectron intensities observed using two or more X‐ray photon energies are normalised using correction factors. These correction factors are derived to determine the <jats:italic>AOS</jats:italic><jats:sub>3λ</jats:sub> from the inelastic scattering signals collected from different samples. The <jats:italic>AOS</jats:italic><jats:sub>3λ</jats:sub> are then compared with the ratio of the elastic XPS peak intensities calculated for different sample depths to find the layer thickness. The method has been applied to analyse spectra collected from thin amorphous carbon films to yield quantitative, standardless and automated XPS analysis.</jats:p>