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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Petit-Etienne, Camille
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2024Precision defect integrated graphene as reliable support membrane for high-resolution cryo-transmission electron microscopy
- 2024Vapor chemical composition in Electron Beam Powder Bed Fusion using Ti-6Al-4V powder
- 2023Preferential crystal orientation etching of GaN nanopillars in Cl2 plasmacitations
- 2022Low-temperature spatially-resolved luminescence spectroscopy of microstructures with strained III-V quantum wells
- 2021Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wellscitations
- 2021Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wellscitations
- 2019Influence of plasma process on III-V/Ge multijunction solar cell via etchingcitations
- 2019Influence of plasma process on III-V/Ge multijunction solar cell via etchingcitations
- 2015Photoemission investigation of the graphene surface cleaning by hydrogen/nitrogen plasmacitations
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conferencepaper
Photoemission investigation of the graphene surface cleaning by hydrogen/nitrogen plasma
Abstract
It is known that graphene surface contaminations by residues affect drastically its intrinsic properties and cannot be avoided when chemical vapor deposited (CVD) graphene is transferred on other substrates. In this work, we investigate by X‐ray photoelectron spectroscopy and work function measurements using X‐ray photoemission electron microscopy the capabilities of high‐density plasmas to clean graphene. The evolution of different chemical species at surface is monitored as a function of plasma exposure. H2 plasmas are shown to clean efficiently PMMA residues from CVD graphene on Cu. However, when the same plasma is used on graphene transferred on SiO2/Si substrate a liftoff of the graphene layer is observed before the end of cleaning procedure. These results are discussed in terms of H+ penetration through graphene and H2 formation between the SiO2 substrate and graphene. Using Cl‐based chemistries, we found that the plasma is able to etch polymeric contamination at the graphene surface. It is also found that the plasma induces spreading of the Si nanoparticle contamination that hampers the cleaning process.