| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Tamm, Aile
University of Tartu
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (17/17 displayed)
- 2024ZIF-8 derived iron-, sulphur-, and nitrogen-doped catalysts for anionexchange membrane fuel cell applicationcitations
- 2023Ag Sputter-Deposited on MnO2-Carbon Nanotube Nanocomposites as Electrocatalysts for Oxygen Reduction Reaction in Alkaline Mediacitations
- 2023Electrospun Carbon Nanofibre‐Based Catalysts Prepared with Co and Fe Phthalocyanine for Oxygen Reduction in Acidic Mediumcitations
- 2022Bipolar Resistive Switching in Hafnium Oxide-Based Nanostructures with and without Nickel Nanoparticlescitations
- 2022Memory Effects in Nanolaminates of Hafnium and Iron Oxide Films Structured by Atomic Layer Depositioncitations
- 2021Optical and mechanical properties of nanolaminates of zirconium and hafnium oxides grown by atomic layer depositioncitations
- 2020Behavior of nanocomposite consisting of manganese ferrite particles and atomic layer deposited bismuth oxide chloride filmcitations
- 2019Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Filmscitations
- 2018Properties of Atomic Layer Deposited Nanolaminates of Zirconium and Cobalt Oxidescitations
- 2018Atomic layer deposition and properties of ZrO2/Fe2O3 thin filmscitations
- 2017Luminescence properties of $mathrm{Er^{3+}}$ doped zirconia thin films and $mathrm{ZrO_2/Er_2O_3}$ nanolaminates grown by atomic layer depositioncitations
- 2015Mechanical properties of aluminum, zirconium, hafnium and tantalum oxides and their nanolaminates grown by atomic layer depositioncitations
- 2014Atomic layer deposition of Zr<scp>O</scp><sub>2</sub> for graphene‐based multilayer structures: <i>In situ</i> and <i>ex situ</i> characterization of growth processcitations
- 2014Modification of Hematite Electronic Properties with Trimethyl Aluminum to Enhance the Efficiency of Photoelectrodescitations
- 2014Holmium and titanium oxide nanolaminates by atomic layer depositioncitations
- 2010Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminatescitations
- 2009Behavior of zirconium oxide films processed from novel monocyclopentadienyl precursors by atomic layer depositioncitations
Places of action
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article
Atomic layer deposition of Zr<scp>O</scp><sub>2</sub> for graphene‐based multilayer structures: <i>In situ</i> and <i>ex situ</i> characterization of growth process
Abstract
Real time monitoring of atomic layer deposition by quartz crystal microbalance (QCM) was used to follow the growth of ZrO2 thin films on graphene. The films were grown from ZrCl4 and H2O on graphene prepared by chemical vapor deposition method on 100‐nm thick nickel film or on Cu‐foil and transferred onto QCM sensor. The deposition was performed at a substrate temperature of 190 °C. The growth of the dielectric film on graphene was significantly retarded compared to the process carried out on QCM without graphene. After the deposition of dielectric films, the basic structure of graphene was retained. <jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="graphic/pssa201330106-gra-0001.png" xlink:title="pssa201330106-gra-0001"