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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Short, Robert D.
University of Sheffield
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2020Plasma polymerization of (2,2,6,6-tetramethylpiperidin-1-yl)oxyl in a collisional, capacitively coupled radio frequency dischargecitations
- 2016Hyperthermal intact molecular ions play key role in retention of ATRP surface initiation capability of plasma polymer films from ethyl alpha-bromoisobutyratecitations
- 2016Fabrication and Characterization of a Porous Silicon Drug Delivery System with an Initiated Chemical Vapor Deposition Temperature-Responsive Coatingcitations
- 2015Comparison of plasma polymerization under collisional and collision-less pressure regimescitations
- 2013Defining plasma polymerizationcitations
- 2012Fabrication and operation of a microcavity plasma array device for microscale surface modificationcitations
- 2011Surface Morphology in the Early Stages of Plasma Polymer Film Growth from Amine-Containing Monomerscitations
- 2009Substrate influence on the initial growth phase of plasma-deposited polymer filmscitations
Places of action
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article
Surface Morphology in the Early Stages of Plasma Polymer Film Growth from Amine-Containing Monomers
Abstract
<p>The manner by which plasma polymers grow in the very first stages of deposition is a topic which has been almost overlooked. We show using atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) that in the early stages of plasma deposition there are significant differences in the way plasma polymers grow from two amine-containing compounds onto silicon wafers. By AFM it is shown that films grown from n-heptylamine (HA) initially show 'island-like' growth before a continuous smooth film is formed. In contrast, films from allylamine grow smoothly from the very earliest stages. XPS data show substantial differences of plasma polymer chemistry in close proximity to the silicon surface manifested in the formation of NH<sup>+</sup><sub>3</sub> and NO<sub>x</sub> species which are more abundant in films of HA. We present a possible explanation for these results based upon post-plasma surface phenomena in the case of HA. In this communication we show that in the early stages of plasma deposition there are significant morphological and chemical differences in the way plasma polymers grow from two amine-containing compounds onto silicon wafers. Films grown from n-heptylamine initially show 'island-like' growth before a continuous smooth film is formed. In contrast, films from allylamine grow smoothly from the very earliest stages. We provide a possible explanation of these findings.</p>