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| Naji, M. |
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Priola, A.
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Topics
Publications (9/9 displayed)
- 2008Preparation of polymer-based composite with magnetic anisotropy by oriented carbon nanotube dispersioncitations
- 2008Use of single-walled carbon nanotubes as reinforcing fillers in UV-curable epoxy systemscitations
- 2005Hybrid nanocomposites containing silica and PEO segments: preparation through dual-curing process and characterizationcitations
- 2005Poly(caprolactone-co-lactide)/perfluoropolyether block copolymers: Synthesis, thermal, and surface characterizationcitations
- 2005Preparation and characterization of hybrid nanocomposite coatings by photopolymerization and sol-gel processcitations
- 2004Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomerscitations
- 2003Hyperbranched Polymers in Cationic Photopolymerization of Epoxy Systemscitations
- 2000Acrylic polyester resins containing perfluoropolyethers structures: Synthesis, characterization, and photopolymerization
- 2000Composites based on carbon fibers and liquid crystalline epoxy resins, 2: Dynamic-mechanical analysis and fracture toughness behavior
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article
Synthesis and Cationic Photopolymerization of New Silicon-Containing Oxetane Monomers
Abstract
<p>The cationic photopolymerization of oxetane-based systems containing silicon monomers was investigated. For this purpose, three new silicon-containing oxetane monomers were synthesized through a simple and straightforward synthetic method. The silicon-containing monomers were added to a typical oxetane resin, 3,3-[oxydi(methylene)]bis(3-ethyloxetane), in concentrations of 1-5 wt %. They exploited a certain surface tension effect without affecting the rate of polymerization. Enrichment only on the air side was achieved, which induced hydrophobicity in the photocured films, depending on the monomer structure and concentration.</p>