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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Cassan, Eric
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (28/28 displayed)
- 2023Controlling the Modal Confinement in Silicon Nanophotonic Waveguides through Dual‐Metamaterial Engineeringcitations
- 2022Heterogeneous Integration of Doped Crystalline Zirconium Oxide for Photonic Applicationscitations
- 2021Enhanced thermal stability of Ni/GeSn system using pre-amorphization by implantationcitations
- 2020Erbium-doped oxide for optical gain on hybrid silicon photonics platforms (Student Paper)
- 202040 Gbps heterostructure germanium avalanche photo receiver on a silicon chipcitations
- 202040 Gbps heterostructure germanium avalanche photo receiver on a silicon chipcitations
- 2020Third Order Nonlinear Optical Susceptibility of Crystalline Oxide Yttria-Stabilized Zirconiacitations
- 2020Impact and behavior of Sn during the Ni/GeSn solid-state reactioncitations
- 2019Towards optical amplification in complex functional oxides: exploring optical gain in erbium-doped yttria-stabilized zirconia waveguidescitations
- 2019Erbium-doped Yttria-stabilized Zirconia thin layers for photonic applications
- 2019Nonlinear third order silicon photonics enabled by dispersion and subwavelength engineeringcitations
- 2019Nonlinear third order silicon photonics enabled by dispersion and subwavelength engineeringcitations
- 2019Effects of alloying elements (Pt or Co) on nickel-based contact technology for GeSn layerscitations
- 2018High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applicationscitations
- 2018High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applicationscitations
- 2018Nonlinear optical properties of integrated GeSbS chalcogenide waveguidescitations
- 2017Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2017Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2017Third Order Nonlinear Properties of GeSbS Chalcogenide Waveguides (poster)
- 2017Linear and Third Order Nonlinear Optical Properties of GeSbS Chalcogenide Integrated Waveguides (Orale)citations
- 2016Integration of Carbon Nanotubes in Silicon Strip and Slot Waveguide Micro-Ring Resonatorscitations
- 2016Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2016Coupling of semiconductor carbon nanotubes emission with silicon photonic microring resonators
- 2016Oxides on Silicon and Sapphire substrates for photonic applications
- 2016Oxides on Silicon and Sapphire substrates for photonic applications
- 2016Integration of carbon nanotubes in slot waveguides (Conference Presentation)
- 2014Investigation of the separate optical nonlinear contributions of the core and cladding materials of silicon photonics slotted waveguides (Poster)
- 2010Carrier depletion based silicon optical modulatorscitations
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article
Controlling the Modal Confinement in Silicon Nanophotonic Waveguides through Dual‐Metamaterial Engineering
Abstract
<jats:title>Abstract</jats:title><jats:p>Flexible control of the modal confinement in silicon photonic waveguides is an appealing feature for many applications, including sensing and hybrid integration of active materials. In most cases, strip waveguides are the preferred solution to maximize the light interaction with the waveguide surroundings. However, the only two degrees of freedom in Si strip waveguides are the width and thickness, resulting in limited flexibility in evanescent field control. Here, a new strategy that exploits metamaterial engineering of the waveguide core and cladding is proposed and demonstrated to control the index contrast in the vertical and horizontal directions, independently. The proposed dual‐material geometry yields a substantially increased calculated bulk sensitivity in the air (0.35 RIU [refractive index unit]/RIU) compared to the best case scenario for a strip waveguide (0.3 RIU/RIU). To experimentally demonstrate the potential of this approach, dual‐metamaterial ring resonators operating with the transverse‐magnetic polarized mode in 220‐nm‐thick waveguides with air as upper‐cladding are implemented. Micro‐ring resonators implemented with strip and dual‐metamaterial waveguides exhibit the same measured quality factors, near 30 000. Having similar measured quality factors and better calculated bulk sensitivity than strip waveguides, the proposed dual‐metamaterial geometry stands as a promising approach to control modal confinement in silicon waveguides.</jats:p>