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Goldbart, Ohad
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article
New deposition technique for metal films containing inorganic fullerene-like (IF) nanoparticles
Abstract
<p>This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene-like structure (Ti/IF-WS<sub>2</sub>) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF-WS<sub>2</sub> by a sprayer head. This process results in IF-WS<sub>2</sub> nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF-WS<sub>2</sub> shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near-IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.</p>