| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Hämäläinen, Jani Marko Antero
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2020Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditionscitations
- 2019How insignificant modifications of photocatalysts can significantly change their photocatalytic activitycitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2016Atomic Layer Deposition of Metal Phosphates and Lithium Silicates
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2014Atomic Layer Deposition of Noble Metals and Their Oxidescitations
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2012Study of amorphous lithium silicate thin films grown by atomic layer depositioncitations
- 2012Lithium Phosphate Thin Films Grown by Atomic Layer Depositioncitations
- 2012Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applicationscitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2010pH electrode based on ALD deposited iridium oxidecitations
- 2009Metallic Ir, IrO2 and Pt Nanotubes and Fibers by Electrospinning and Atomic Layer Deposition
- 2009Study on atomic layer deposition of amorphous rhodium oxide thin filmscitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozonecitations
Places of action
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article
Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Deposition
Abstract
henium is both a refractory metal and a noble metal that has attractive properties for various applications. Still, synthesis and applications of rhenium thin films have been limited. We introduce herein the growth of both rhenium metal and rhenium nitride thin films by the technologically important atomic layer deposition (ALD) method over a wide deposition temperature range using fast, simple, and robust surface reactions between rhenium pentachloride and ammonia. Films are grown and characterized for compositions, surface morphologies and roughnesses, crystallinities, and resistivities. Conductive rhenium subnitride films of tunable composition are obtained at deposition temperatures between 275 and 375 °C, whereas pure rhenium metal films grow at 400 °C and above. Even a just 3 nm thick rhenium film is continuous and has a low resistivity of about 90 µΩ cm showing potential for applications for which also other noble metals and refractory metals have been considered.