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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ueki, Takeshi
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Publications (5/5 displayed)
- 2016Hierarchical Sol-Gel Transition Induced by Thermosensitive Self-Assembly of an ABC Triblock Polymer in an Ionic Liquidcitations
- 2015Thermally Reversible Ion Gels with Photohealing Properties Based on Triblock Copolymer Self-Assemblycitations
- 2015Photoreversible gelation of a triblock copolymer in an ionic liquidcitations
- 2012Light-controlled reversible micellization of a diblock copolymer in an ionic liquidcitations
- 2011UCST phase transition of azobenzene-containing random copolymer in an ionic liquidcitations
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article
Photoreversible gelation of a triblock copolymer in an ionic liquid
Abstract
<p>The reversible micellization and sol-gel transition of block copolymer solutions in an ionic liquid (IL) triggered by a photostimulus is described. The ABA triblock copolymer employed, denoted P(AzoMA-r-NIPAm)-b-PEO-b-P(AzoMA-r-NIPAm)), has a B block composed of an IL-soluble poly(ethylene oxide) (PEO). The A block consists of a random copolymer including thermosensitive N-isopropylacrylamide (NIPAm) units and a methacrylate with an azobenzene chromophore in the side chain (AzoMA). A phototriggered reversible unimer-to-micelle transition of a dilute ABA triblock copolymer (1 wt%) was observed in an IL, 1-butyl-3-methylimidazolium hexafluorophosphate ([C<sub>4</sub>mim]PF<sub>6</sub>), at an intermediate "bistable" temperature (50°C). The system underwent a reversible sol-gel transition cycle at the bistable temperature (53°C), with reversible association/fragmentation of the polymer network resulting from the phototriggered self-assembly of the ABA triblock copolymer (20 wt%) in [C<sub>4</sub>mim]PF<sub>6</sub>.</p>