Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (6/6 displayed)

  • 2022Room temperature phase transition of W-doped VO2 by atomic layer deposition on 200 mm Si wafers and flexible substrates40citations
  • 2022VO2metasurface smart thermal emitter with high visual transparency for passive radiative cooling regulation in space and terrestrial applications90citations
  • 2018Germanium implanted photonic devices for post-fabrication trimming and programmable circuits1citations
  • 2018Real-time monitoring and gradient feedback enable accurate trimming of ion-implanted silicon photonic devices24citations
  • 2013Multi-beam PLD of magneto-optic garnetscitations
  • 2013Tailoring of YIG film properties via compositional tuning by multi-beam pulsed laser depositioncitations

Places of action

Chart of shared publication
Urbani, Alessandro
2 / 4 shared
Hillier, James A.
1 / 2 shared
Kalfagiannis, Nikolaos
1 / 10 shared
De Groot, Cornelis
1 / 41 shared
Sun, Kai
2 / 7 shared
Ye, Sheng
1 / 4 shared
Zeimpekis, Ioannis
1 / 24 shared
Wheeler, Callum
2 / 5 shared
Simeoni, Mirko
1 / 2 shared
Mengali, Sandro
1 / 2 shared
Groot, C. H. Kees De
1 / 2 shared
Xiao, Wei
1 / 3 shared
Gaspari, Matteo
1 / 2 shared
Reed, Graham T.
1 / 5 shared
Thomson, David J.
1 / 4 shared
Chen, Xia
2 / 11 shared
Chen, Bigeng
2 / 2 shared
Yu, Xingshi
2 / 3 shared
Saito, Shinichi
2 / 5 shared
Peacock, Anna C.
1 / 47 shared
Runge, Antoine F. J.
1 / 4 shared
Khokhar, Ali Z.
1 / 4 shared
Milošević, Milan M.
1 / 1 shared
Khokhar, Ali
1 / 6 shared
Reed, Graham
1 / 6 shared
Milošević, Milan
1 / 6 shared
Thomson, David
1 / 8 shared
Stenning, G. B. G.
2 / 5 shared
Sposito, A.
2 / 7 shared
Gregory, S. A.
2 / 3 shared
Eason, Robert W.
2 / 65 shared
Groot, P. A. J. De
2 / 10 shared
Parsonage, T.
1 / 2 shared
Sloyan, K.
1 / 1 shared
Chart of publication period
2022
2018
2013

Co-Authors (by relevance)

  • Urbani, Alessandro
  • Hillier, James A.
  • Kalfagiannis, Nikolaos
  • De Groot, Cornelis
  • Sun, Kai
  • Ye, Sheng
  • Zeimpekis, Ioannis
  • Wheeler, Callum
  • Simeoni, Mirko
  • Mengali, Sandro
  • Groot, C. H. Kees De
  • Xiao, Wei
  • Gaspari, Matteo
  • Reed, Graham T.
  • Thomson, David J.
  • Chen, Xia
  • Chen, Bigeng
  • Yu, Xingshi
  • Saito, Shinichi
  • Peacock, Anna C.
  • Runge, Antoine F. J.
  • Khokhar, Ali Z.
  • Milošević, Milan M.
  • Khokhar, Ali
  • Reed, Graham
  • Milošević, Milan
  • Thomson, David
  • Stenning, G. B. G.
  • Sposito, A.
  • Gregory, S. A.
  • Eason, Robert W.
  • Groot, P. A. J. De
  • Parsonage, T.
  • Sloyan, K.
OrganizationsLocationPeople

article

Room temperature phase transition of W-doped VO2 by atomic layer deposition on 200 mm Si wafers and flexible substrates

  • Urbani, Alessandro
  • Hillier, James A.
  • Kalfagiannis, Nikolaos
  • De Groot, Cornelis
  • Sun, Kai
  • Ye, Sheng
  • Muskens, Otto
  • Zeimpekis, Ioannis
  • Wheeler, Callum
Abstract

<p>The unique structural transition of VO<sub>2</sub> between dielectric and metallic phases has significant potential in optical and electrical applications ranging from volatile switches and neuromorphic computing to smart devices for thermochromic control and radiative cooling. Critical condition for their widespread implementation is scalable deposition method and reduction of the phase transition to near room temperature. Here, a W:VO<sub>2</sub> process based on atomic layer deposition (ALD) is presented that enables precise control of W-doping at the few percent level, resulting in a viable controllable process with sufficient W incorporation into VO<sub>2</sub> to reduce the phase transition to room temperature. It is demonstrated that the incorporation of 1.63 at.% W through ALD growth leads to a state-of-the-art phase transition at 32 °C with emissivity contrast between the low-temperature and high-temperature phase exceeding 40% in a metasurface-based radiative cooling device configuration. The process is shown to be viable on 200 mm silicon substrates as well as flexible polyimide films. The full and self-consistent temperature-dependent characterization of the W-doped VO<sub>2</sub> using spectroscopic ellipsometry, electrical conductivity, mid-wave infrared camera, and Fourier transform infrared emissivity, allows for a fully validated material model for the theoretical design of various smart and switchable device applications.</p>

Topics
  • impedance spectroscopy
  • phase
  • phase transition
  • Silicon
  • ellipsometry
  • electrical conductivity
  • atomic layer deposition