| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Putkonen, Matti
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (39/39 displayed)
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2024Atomic Layer Deposition of Molybdenum Carbide Thin Filmscitations
- 2023Molecular layer deposition of hybrid silphenylene-based dielectric filmcitations
- 2023Regularly arranged ZnO/TiO2, HfO2, and ZrO2 core/shell hybrid nanostructures - towards selection of the optimal shell material for efficient ZnO-based UV light emitterscitations
- 2023Atomic Layer Deposition of Boron-Doped Al2O3 Dielectric Filmscitations
- 2022Comparison of the Growth and Thermal Properties of Nonwoven Polymers after Atomic Layer Deposition and Vapor Phase Infiltration
- 2022Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments
- 2021Comparison of the Growth and Thermal Properties of Nonwoven Polymers after Atomic Layer Deposition and Vapor Phase Infiltrationcitations
- 2021Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursorscitations
- 2021Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl5 as Precursorscitations
- 2021Comparison of the growth and thermal properties of nonwoven polymers after atomic layer deposition and vapor phase infiltrationcitations
- 2020HOR Activity of Pt-TiO 2-Y at Unconventionally High Potentials Explained:The Influence of SMSI on the Electrochemical Behavior of Ptcitations
- 2020Infrared Absorption Study of Zn-S Hybrid and ZnS Ultrathin Films Deposited on Porous AAO Ceramic Supportcitations
- 2019Structural and optical characterization of ZnS ultrathin films prepared by low-temperature ALD from diethylzinc and 1.5-pentanedithiol after various annealing treatmentscitations
- 2018Structural distinction due to deposition method in ultrathin films of cellulose nanofibrescitations
- 2018Time-Dependent Behavior of Cation Transport through Cellulose Acetate-Cationic Polyelectrolyte Membranescitations
- 2018Atomic layer deposition of Ti-Nb-O thin films onto electrospun fibers for fibrous and tubular catalyst support structurescitations
- 2017Method for forming catalytic nanocoating
- 2017Electrospun sheet materials from CA, PES and PLLA as supports for ALD coating
- 2016Comparative study of ALD SiO2 thin films for optical applicationscitations
- 2016Fibrous and tubular support materials by electrospinning and atomic layer deposition (ALD) for PEM fuel cells for automotive MEAs
- 2015Fibrous and tubular support materials using in catalyst support materials for low-Pt PEM fuel cells for automotive MEAs
- 2015The effect of physical adhesion promotion treatments on interfacial adhesion in cellulose-epoxy
- 2015Fibrous and tubular structures for PEMFC catalyst supports combining electrospinning, heat treatments and atomic layer deposition (ALD)
- 2014Core-shell carbon-ceramic fibres by electrospinning and atomic layer deposition (ALD)
- 2014ALD thin films for PEM fuel cells for automotive MEAs
- 2014Atomic Layer Deposited Nanoscale Coatings for Polymer Films
- 2014ALD materials in catalyst support materials on PEM fuel cells for automotive MEAs
- 2014Adjusting hydrophobic and hydrophilic properties by ALD and MLD
- 2014Atomic layer deposited thin barrier films for packaging
- 2014Scaling up MnCo2O4 ALD Process for Coating SOFC Interconnect Plates
- 2014Antibacterial and barrier properties of oriented polymer films with ZnO thin films applied with atomic layer deposition at low temperaturescitations
- 2013Safety Aspects of Polymer Films with Atomic Layer Deposited Thin Al2O3 Barrier Layers
- 2013Safety aspects of polymer films with thin Al 2 O 3 barrier
- 2013ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium
- 2013Safety aspects of polymer films with thin Al2O3 barrier
- 2013Core-shell carbon-ceramic fibres by electrospinning and atomic layer deposition (ALD) for fuel cell catalyst supports
- 2010Rare earth scandate thin films by atomic layer depositioncitations
- 2005New approach to the ALD of Bismuth silicatescitations
Places of action
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article
Atomic Layer Deposition of Molybdenum Carbide Thin Films
Abstract
The development of deposition processes for metal carbide thin films is rapidly advancing, driven by their potential for applications including catalysis, batteries, and semiconductor devices. Within this landscape, atomic layer deposition (ALD) offers exceptional conformality, uniformity, and thickness control on spatially complex structures. This paper presents a comprehensive study on the thermal ALD of MoCx with MoCl5 and 1,4-bis(trimethylgermyl)-1,4-dihydropyrazine [(Me3Ge)2DHP] as precursors, focusing on the functional properties and characterization of the films. The depositions are conducted at 200–300 °C and very smooth films with RMS Rq ≈0.3–0.6 nm on Si, TiN, and HfO2 substrates are obtained. The process has a high growth rate of 1.5 Å cycle−1 and the films appear to be continuous already after 5 cycles. The films are conductive even at thicknesses below 5 nm, and films above 18 nm exhibit superconductivity up to 4.4 K. In lieu of suitable references, Raman modes for molybdenum carbides and nitrides are calculated and X-ray diffraction and X-ray photoelectron spectroscopy are used for phase analysis.