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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Amati, Matteo
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (13/13 displayed)
- 2023In situ study of electrochemical activation and surface segregation of the SOFC electrode material La0.75Sr0.25r0.5 Mn0.5O3±delta
- 2023Spatially‐Modulated Silicon Interface Energetics Via Hydrogen Plasma‐Assisted Atomic Layer Deposition of Ultrathin Aluminacitations
- 2022Synthesis and characterization of MWCNT-COOH/Fe3O4 and CNT-COOH/Fe3O4/NiO nanocomposites: assessment of adsorption and photocatalytic performancecitations
- 2020Atomic and electronic structure of a multidomain GeTe crystalcitations
- 2018Depth-Dependent Scanning Photoelectron Microspectroscopy Unravels the Mechanism of Dynamic Pattern Formation in Alloy Electrodepositioncitations
- 2017An in situ near-ambient pressure X-ray photoelectron spectroscopy study of CO2 reduction at Cu in a SOE cellcitations
- 2017Low temperature growth of fully covered single-layer graphene using a CoCu catalystcitations
- 2017Low temperature growth of fully covered single-layer graphene using a CoCu catalyst.
- 2017An in situ near-ambient pressure X-ray photoelectron spectroscopy study of CO 2 reduction at Cu in a SOE cellcitations
- 2016Fabrication of Ti substrate grain dependent C/TiO2 composites through carbothermal treatment of anodic TiO2citations
- 2015Tuning electronic properties of carbon nanotubes by nitrogen grafting: Chemistry and chemical stabilitycitations
- 2013Tubular Sn-filled carbon nanostructures on ITO: Nanocomposite material for multiple applicationscitations
- 2013Tubular Sn-filled carbon nanostructures on ITO: Nanocomposite material for multiple applicationscitations
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article
Spatially‐Modulated Silicon Interface Energetics Via Hydrogen Plasma‐Assisted Atomic Layer Deposition of Ultrathin Alumina
Abstract
Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on scalable processes for interface manipulation of structured surfaces on the atomic level. While ALD allows the synthesis of conformal films with utmost control over the thickness, atomically‐defined closed coatings and surface modifications are challenging to achieve because of 3D growth during nucleation. Here, a route is presented toward the sub‐nanometer thin and continuous aluminum oxide (AlOx) coatings on silicon substrates for the spatial control of the surface charge density and interface energetics. Trimethylaluminum in combination with remote hydrogen plasma is used instead of a gas‐phase oxidant for the transformation of silicon dioxide (SiO2) into alumina. Depending on the number of ALD cycles, the SiO2 can be partially or fully transformed, which is exploited to deposit ultrathin AlOx layers in selected regions defined by lithographic patterning. The resulting patterned surfaces are characterized by lateral AlOx/SiO2 interfaces possessing 0.3 nm step heights and surface potential steps exceeding 0.4 V. In addition, the introduction of fixed negative charges of 9 × 10^12 cm-2 enables modulation of the surface band bending, which is relevant to the field‐effect passivation of silicon and low‐impedance charge transfer across contact interfaces.