| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Van Driessche, Isabel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (20/20 displayed)
- 2023Progress towards a solution-derived (Ba,Ca)(Ti,Zr)O3 film on a Si-based platform as a lead-free alternative
- 2023Textured growth of oxide materials via chemical solution deposition : a case study for electro-optical thin films
- 2023Hafnium oxide nanocrystals for contrast enhanced vascular casting : from mechanistic insight to application
- 2023Progress towards piezoelectric (Ba,Ca)(Ti,Zr)O3 thin film using wet chemical solution deposition
- 2023Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layerscitations
- 2023Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layerscitations
- 2023Controlled BZO nanorod growth and improved flux pinning in YBCO films grown on vicinal STO substratescitations
- 2022Chemical solution deposition of MTiO3 based buffer and YBCO nanocomposite films with preformed metal oxide nanocrystals prior to coated conductors
- 2022Optimized BaZrO3 nanorod density in YBa2Cu3O6+x matrix for high field applicationscitations
- 2022Superconducting HfO2-added solution-derived YBa2Cu3O7 nanocomposite films : the effect of colloidal nanocrystal shape and crystallinity on pinning mechanismcitations
- 2022Strongly enhanced growth of high-temperature superconducting films on an advanced metallic templatecitations
- 2021Colloidal Oxide Perovskite Nanocrystals: from Synthesis to Applicationcitations
- 2021Hybrid nanocomposites formed by lanthanide nanoparticles in Zr-MOF for local temperature measurements during catalytic reactionscitations
- 2021Colloidal oxide perovskite nanocrystals : from synthesis to applicationcitations
- 2020High critical current density and enhanced pinning in superconducting films of YBa2Cu3O7-δ nanocomposites with embedded BaZrO3, BaHfO3, BaTiO3, and SrZrO3 nanocrystalscitations
- 2017Continuous-feed nanocasting process for the synthesis of bismuth nanowire compositescitations
- 2017Stabilization of Colloidal Ti, Zr, and Hf Oxide Nanocrystals by Protonated Tri- n -octylphosphine Oxide (TOPO) and Its Decomposition Products
- 2016Synergy Effects of the Mixture of Bismuth Molybdate Catalysts with SnO2/ZrO2/MgO in Selective Propene Oxidation and the Connection between Conductivity and Catalytic Activitycitations
- 2011Tuning of CeO2 buffer layers for coated superconductors through metal doping
- 2009TEM investigation of the LZO sol gel system
Places of action
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article
Low temperature area selective atomic layer deposition of ruthenium dioxide thin films using polymers as inhibition layers
Abstract
Area selective atomic layer deposition (AS-ALD) is an interesting bottom-up approach due to its self-aligned fabrication potential. Ruthenium dioxide (RuO2) is an important material for several applications, including microelectronics, demanding area selective processing. Herein, it is shown that ALD of RuO2 using methanol and RuO4 as reactants results in uninhibited continuous growth on SiO2, whereas there is no deposition on polymethyl methacrylate (PMMA) blanket films even up to 200 ALD cycles, resulting in around 25 nm of selective RuO2 deposition on SiO2. The excellent selectivity of the process is verified with X-ray photoelectron spectroscopy, X-ray fluorescence, and scanning transmission electron microscopy. AS-ALD is possible at deposition temperatures as low as 60 °C, with an area selective window from 60 to 120 °C. The deposition of RuO2 using other coreactants namely ethanol and isopropanol in combination with RuO4 increases the process's growth rate while maintaining selectivity. Testing different polymer thin films such as poly(ethylene terephthalate glycol), (poly(lauryl methacrylate)-co-ethylene glycol dimethacrylate), polystyrene, and Kraton reveals an important relationship between polymer structure and the applicability of such polymers as mask layers. Finally, the developed method is demonstrated by selectively depositing RuO2 on patterned SiO2/PMMA samples, followed by PMMA removal, resulting in RuO2 nanopatterns.