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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Rogalla, Detlef
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (26/26 displayed)
- 2024Distributed Feedback Lasing in Thermally Imprinted Phase‐Stabilized CsPbI3 Thin Filmscitations
- 2024A sustainable CVD approach for ZrN as a potential catalyst for nitrogen reduction reaction
- 2024Wafer‐Scale Demonstration of Polycrystalline MoS<sub>2</sub> Growth on 200 mm Glass and SiO<sub>2</sub>/Si Substrates by Plasma‐Enhanced Atomic Layer Depositioncitations
- 2023Plasma-enhanced atomic layer deposition of molybdenum oxide thin films at low temperatures for hydrogen gas sensingcitations
- 2022Unusual phase formation in reactively sputter‐deposited La-Co-O thin‐film librariescitations
- 2022SnO deposition via water based ALD employing tin(ii) formamidinate: precursor characterization and process developmentcitations
- 2021Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films:Investigation of Structure and Pseudocapacitive Propertiescitations
- 2021Influence of low Bi contents on phase transformation properties of VO<sub>2</sub> studied in a VO<sub>2</sub>:Bi thin film librarycitations
- 2021Chemical vapor deposition of cobalt and nickel ferrite thin films
- 2021Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Propertiescitations
- 2021Direct liquid injection chemical vapor deposition of ZrO2 films from a heteroleptic Zr precursor: Interplay between film characteristics and corrosion protection of stainless steelcitations
- 2020From Precursor Chemistry to Gas Sensors:Plasma-Enhanced Atomic Layer Deposition Process Engineering for Zinc Oxide Layers from a Nonpyrophoric Zinc Precursor for Gas Barrier and Sensor Applicationscitations
- 2020From precursor chemistry to gas sensors
- 2019Effects of the Ion to growth flux ratio on the constitution and mechanical properties of Cr1–x-Alx-N thin filmscitations
- 2018Influences of W content on the phase transformation properties and the associated stress change in thin film substrate combinations studied by fabrication and characterization of thin film V1-xWxO2 materials librariescitations
- 2017Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer depositioncitations
- 2016Influence of post-hydrogenation upon electrical, optical and structural properties of hydrogen-less sputter-deposited amorphous siliconcitations
- 2015Morphology and Hydrogen in Passivating Amorphous Silicon Layerscitations
- 2014Tailoring iron(III) oxide nanomorphology by chemical vapor deposition: growth and characterizationcitations
- 2013High-throughput compositional and structural evaluation of a Lia(NixMnyCoz)Or thin film battery materials librarycitations
- 2012Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor depositioncitations
- 2012Influence of process parameters on the crystallinity, morphology and composition of tungsten oxide-based thin films grown by metalorganic chemical vapor deposition
- 2012Fabrication of ZrO2 and ZrN films by metalorganic chemical vapor deposition employing new Zr precursors
- 2012Rare-earth substituted HfO2 thin films grown by metalorganic chemical vapor deposition
- 2010Engineered tungsten oxy-nitride thin film materials for photocatalytical water splitting fabricated by MOCVDcitations
- 2010Volatile, monomeric, and fluorine-free precursors for the metal organic chemical vapor deposition of zinc oxide
Places of action
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article
Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties
Abstract
<jats:title>Abstract</jats:title><jats:p>Transition metal ferrites, such as CoFe<jats:sub>2</jats:sub>O<jats:sub>4</jats:sub> (CFO) and NiFe<jats:sub>2</jats:sub>O<jats:sub>4</jats:sub> (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrates and the possibility for coverage of 3D substrates, two CVD processes are reported for CFO and NFO. Growth rates amount to 150 to 200 nm h<jats:sup>−1</jats:sup> and yield uniform, dense, and phase pure spinel ferrite films according to X‐ray diffraction (XRD), Raman spectroscopy, Rutherford backscattering spectrometry and nuclear reaction analysis (RBS/NRA) and scanning electron microscopy (SEM). Atom probe tomography (APT) and synchrotron X‐ray photoelectron spectroscopy (XPS) give insights into the vertical homogeneity and oxidation states in the CFO films. Cation disorder of CFO is analyzed for the first time from synchrotron‐based XPS. NFO is analyzed via lab‐based XPS. Depositions on conducting Ni and Ti substrates result in electrodes with pseudocapacitive behavior, as evidenced by cyclovoltammetry (CV) experiments. The interfacial capacitances of the electrodes are up to 185 µF cm<jats:sup>−2</jats:sup>.</jats:p>