| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Wree, Jan-Lucas
Ruhr University Bochum
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023Fe2O3-graphitic carbon nitride nanocomposites analyzed by XPScitations
- 2023Plasma-enhanced atomic layer deposition of molybdenum oxide thin films at low temperatures for hydrogen gas sensingcitations
- 2022Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing applicationcitations
- 2022Nucleation and growth studies of large-area deposited WS(_2) on flexible substrates
- 2021Raman spectroscopy as an effective tool for characterizing large-area 2D TMDs deposited from the gas phase
- 2021Chemical vapor deposition of cobalt and nickel ferrite thin films
- 2021Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Propertiescitations
- 2019Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursors : Process Development, Film Characterization, and Gas Sensing Propertiescitations
- 2018Atomic Layer Deposition of Molybdenum and Tungsten Oxide Thin Films Using Heteroleptic Imido-Amidinato Precursorscitations
Places of action
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article
Chemical Vapor Deposition of Cobalt and Nickel Ferrite Thin Films: Investigation of Structure and Pseudocapacitive Properties
Abstract
<jats:title>Abstract</jats:title><jats:p>Transition metal ferrites, such as CoFe<jats:sub>2</jats:sub>O<jats:sub>4</jats:sub> (CFO) and NiFe<jats:sub>2</jats:sub>O<jats:sub>4</jats:sub> (NFO), have gained increasing attention as potential materials for supercapacitors. Since chemical vapor deposition (CVD) offers advantages like interface quality to the underlying substrates and the possibility for coverage of 3D substrates, two CVD processes are reported for CFO and NFO. Growth rates amount to 150 to 200 nm h<jats:sup>−1</jats:sup> and yield uniform, dense, and phase pure spinel ferrite films according to X‐ray diffraction (XRD), Raman spectroscopy, Rutherford backscattering spectrometry and nuclear reaction analysis (RBS/NRA) and scanning electron microscopy (SEM). Atom probe tomography (APT) and synchrotron X‐ray photoelectron spectroscopy (XPS) give insights into the vertical homogeneity and oxidation states in the CFO films. Cation disorder of CFO is analyzed for the first time from synchrotron‐based XPS. NFO is analyzed via lab‐based XPS. Depositions on conducting Ni and Ti substrates result in electrodes with pseudocapacitive behavior, as evidenced by cyclovoltammetry (CV) experiments. The interfacial capacitances of the electrodes are up to 185 µF cm<jats:sup>−2</jats:sup>.</jats:p>