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Niemi, Teemu Yrjö Manuel
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article
Atomic Layer Deposition of Zinc Glutarate Thin Films
Abstract
Deposition of zinc glutarate thin films by atomic layer deposition is studied at 200-250 degrees C using zinc acetate and glutaric acid as the precursors. The films are characterized by UV-vis spectrophotometry, X-ray diffraction, Fourier transform infrared spectroscopy, field emission scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and time-of-flight elastic recoil detection analysis. According to X-ray diffraction, the films deposited at 200 degrees C are crystalline with a crystal structure matching to zinc glutarate. The elastic recoil detection analysis shows that the composition of the films is a close match to zinc glutarate. Catalytic activity of the films is demonstrated using the copolymerization reaction of propylene oxide and CO2