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Huskens, Jurriaan
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Publications (9/9 displayed)
- 2023Solvent Optimization Studies for a New EURO-GANEX Process with 2,2'-Oxybis(<i>N,N</i>-di-<i>n</i>-decylpropanamide) (mTDDGA) and Its Radiolysis Productscitations
- 2017Highly doped silicon nanowires by monolayer dopingcitations
- 2013Symmetric Large-Area Metal-Molecular Monolayer-Metal Junctions by Wedging Transfercitations
- 2011Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayerscitations
- 2010Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabricationcitations
- 2010Visualizing resonance energy transfer in supramolecular surface patterns of β-CD-functionalized quantum dot hosts and organic dye guests by fluorescence lifetime imagingcitations
- 2009Microcontact Printing of Dendrimers, Proteins, and Nanoparticles by Porous Stampscitations
- 2008Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithographycitations
- 2008Monolithics silicon nano-ridge fabrication by edge lithography and wet anisotropic etching of silicon
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article
Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayers
Abstract
Micrometer-scale monolayer patterns of a phosphorus-containing molecular precursor are fabricated on nearly intrinsic Si(100) using nanoimprint lithography. The patterned sample is protected by a SiO2capping layer applied by electron beam evaporation and subjected to rapid thermal annealing (RTA) to diffuse the phosphorus dopant atoms into the bulk silicon locally.