| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Menéndez, Enric
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2024Controlling Magneto‐Ionics by Defect Engineering Through Light Ion Implantationcitations
- 2024Ionic control of magnetism in all-solid-state CoO x /yttria-stabilized zirconia heterostructurescitations
- 2024Magnetoionics for Synaptic Devices and Neuromorphic Computing : Recent Advances, Challenges, and Future Perspectivescitations
- 2020Enhancing Magneto-Ionic Effects in Magnetic Nanostructured Films via Conformal Deposition of Nanolayers with Oxygen Acceptor/Donor Capabilities
- 2019Reversible, Electric-Field Induced Magneto-Ionic Control of Magnetism in Mesoporous Cobalt Ferrite Thin Filmscitations
- 2018Large magnetoelectric effects in electrodeposited nanoporous microdisks driven by effective surface charging and magneto-ionicscitations
- 2018Electrodeposited Ni-Based Magnetic Mesoporous Films as Smart Surfaces for Atomic Layer Deposition: An “All-Chemical” Deposition Approach toward 3D Nanoengineered Composite Layers
- 2018Voltage-controlled ON-OFF ferromagnetism at room temperature in a single metal oxide filmcitations
- 2010Out-of-plane magnetic patterning on austenitic stainless steels using plasma nitridingcitations
- 2010Nanocrystalline Electroplated Cu–Ni: Metallic Thin Films with Enhanced Mechanical Properties and Tunable Magnetic Behaviorcitations
Places of action
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article
Controlling Magneto‐Ionics by Defect Engineering Through Light Ion Implantation
Abstract
<jats:title>Abstract</jats:title><jats:p>Magneto‐ionics relies on the voltage‐driven transport of ions to modify magnetic properties. As a diffusion‐controlled mechanism, defects play a central role in determining ion motion and, hence, magneto‐ionic response. Here, the potential of ion implantation is exploited to engineer depth‐resolved defect type and density with the aim to control the magneto‐ionic behavior of Co<jats:sub>3</jats:sub>O<jats:sub>4</jats:sub> thin films. It is demonstrated that through a single implantation process of light ions (He<jats:sup>+</jats:sup>) at 5 keV, the magneto‐ionic response of a nanostructured 50 nm thick Co<jats:sub>3</jats:sub>O<jats:sub>4</jats:sub> film, in terms of rate and amount of induced magnetization, at short‐, mid‐, and long‐term voltage actuation, can be controlled by varying the generated collisional damage through the ion fluence. These results constitute a proof‐of‐principle that paves the way to further use ion implantation (tuning the ion nature, energy, fluence, target temperature, or using multiple implantations) to enhance performance in magneto‐ionic systems, with implications in ionic‐based devices.</jats:p>