| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Huskens, Jurriaan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023Solvent Optimization Studies for a New EURO-GANEX Process with 2,2'-Oxybis(<i>N,N</i>-di-<i>n</i>-decylpropanamide) (mTDDGA) and Its Radiolysis Productscitations
- 2017Highly doped silicon nanowires by monolayer dopingcitations
- 2013Symmetric Large-Area Metal-Molecular Monolayer-Metal Junctions by Wedging Transfercitations
- 2011Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayerscitations
- 2010Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabricationcitations
- 2010Visualizing resonance energy transfer in supramolecular surface patterns of β-CD-functionalized quantum dot hosts and organic dye guests by fluorescence lifetime imagingcitations
- 2009Microcontact Printing of Dendrimers, Proteins, and Nanoparticles by Porous Stampscitations
- 2008Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithographycitations
- 2008Monolithics silicon nano-ridge fabrication by edge lithography and wet anisotropic etching of silicon
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article
Symmetric Large-Area Metal-Molecular Monolayer-Metal Junctions by Wedging Transfer
Abstract
A method is described for fabricating and electrically characterizing large-area (100–400 μm2) metal-molecular monolayer-metal junctions with a relatively high overall yield of ≈45%. The measurement geometry consists of ultra-smooth (template-stripped) patterned Au bottom electrodes, combined with ultra-smooth top Au electrodes deposited using wedging transfer. The fabrication method is applied to the electrical characterization of Au-alkanethiol self-assembled monolayer-Au junctions. An exponential decay of the current density is found for increasing the chain length of the alkanethiols, in agreement with earlier studies. The symmetric device geometry, and flexibility for contacting monolayers with various end groups are important advantages compared to existing techniques for electrically characterizing molecular monolayers.