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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Blanford, Christopher F.
University of Manchester
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2019Graphene–aramid nanocomposite fibres via superacid co-processingcitations
- 2019A Method for Metal/Protein Stoichiometry Determination Using Thin-Film Energy Dispersive X-ray Fluorescence Spectroscopycitations
- 2019Nonwoven Membrane Supports from Renewable Resources: Bamboo Fiber Reinforced Poly(Lactic Acid) Compositescitations
- 2019Nonwoven Membrane Supports from Renewable Resources: Bamboo Fiber Reinforced Poly(Lactic Acid) Compositescitations
- 2018Robust Covalently Crosslinked Polybenzimidazole/Graphene Oxide Membranes for High-Flux Organic Solvent Nanofiltrationcitations
- 2018Robust Covalently Cross-linked Polybenzimidazole/Graphene Oxide Membranes for High-Flux Organic Solvent Nanofiltrationcitations
- 2011The control of shrinkage and thermal instability in SU-8 photoresists for holographic lithographycitations
- 2008In situ high-temperature electron microscopy of 3DOM cobalt, iron oxide, and nickelcitations
- 2006Determination of void arrangements in inverse opals by transmission electron microscopycitations
- 2006The pyrolytic graphite surface as an enzyme substrate: Microscopic and spectroscopic studiescitations
- 2004A method for determining void arrangements in inverse opalscitations
- 2000Preparation and structure of 3D ordered macroporous alloys by PMMA colloidal crystal templating
Places of action
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article
The control of shrinkage and thermal instability in SU-8 photoresists for holographic lithography
Abstract
The negative-tone epoxy photoresist, SU-8, expands ≈1% by volume after postexposure baking. However, if the maximum optical fl uence is comparable to that at the insolubility threshold, as in a holographic exposure, the developed resist shrinks ( ≈35% by volume) due to the removal of light oligomers not incorporated into the polymeric network. IR spectroscopy shows that, at this level of exposure, only 15% of the epoxy groups in the insoluble polymer have reacted; consequently microstructural elements soften and collapse at > 100 °C. When the light oligomers are removed, the sensitivity of the resist is unchanged, provided that 5% (w/w) of a high-molecular-weight reactive plasticizer (glycidoxy-terminated polyethylene glycol) is added, but it shrinks less on development and, when used as a photonic crystal template, shows improved uniformity with less cracking and buckling. Reinforcing the polymer network by reaction with the polyfunctional amine (bis- N , N′ -(3-aminopropyl) ethylenediamine) increases the extent of cross-linking and the thermal stability, allowing inverse replicas of photonic crystal templates to be fabricated from both Al:ZnO and Zr3N4 using atomic layer deposition at temperatures up to 200 °C. © 2011 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.