People | Locations | Statistics |
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Ferrari, A. |
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Schimpf, Christian |
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Dunser, M. |
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Thomas, Eric |
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Gecse, Zoltan |
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Tsrunchev, Peter |
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Della Ricca, Giuseppe |
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Cios, Grzegorz |
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Hohlmann, Marcus |
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Dudarev, A. |
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Mascagna, V. |
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Santimaria, Marco |
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Poudyal, Nabin |
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Piozzi, Antonella |
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Mørtsell, Eva Anne |
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Jin, S. |
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Noel, Cédric |
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Fino, Paolo |
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Mailley, Pascal |
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Meyer, Ernst |
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Zhang, Qi |
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Pfattner, Raphael | Brussels |
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Kooi, Bart J. |
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Babuji, Adara |
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Pauporte, Thierry |
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Greczynski, Grzegorz
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (78/78 displayed)
- 2023Discovery of Guinier-Preston zone hardening in refractory nitride ceramicscitations
- 2023Dense and hard TiWC protective coatings grown with tungsten ion irradiation using WC-HiPIMS/TiC-DCMS co-sputtering technique without external heatingcitations
- 2023Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heatingcitations
- 2023Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditionscitations
- 2023Phase separation paths in metastable Zr1-xAlxN monolithic layers compared to multilayers with TiN: Growth versus annealing temperatures
- 2022Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumptioncitations
- 2022The effect of the Nb concentration on the corrosion resistance of nitrogen-containing multicomponent TiZrTaNb-based films in acidic environmentscitations
- 2022High-entropy transition metal nitride thin films alloyed with Al : Microstructure, phase composition and mechanical propertiescitations
- 2022Domain epitaxial growth of Ta3N5 film on c-plane sapphire substratecitations
- 2022Thermal, electrical, and mechanical properties of hard nitrogen-alloyed Cr thin films deposited by magnetron sputteringcitations
- 2021Influence of Si content on phase stability and mechanical properties of TiAlSiN films grown by AlSi-HiPIMS/Ti-DCMS co-sputteringcitations
- 2021Phase formation and structural evolution of multicomponent (CrFeCo)Ny filmscitations
- 2021Age hardening in superhard ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2021Towards reliable X-ray photoelectron spectroscopy: Sputter-damage effects in transition metal borides, carbides, nitrides, and oxidescitations
- 2021Multifunctional ZrB2-rich Zr1-xCrxBy thin films with enhanced mechanical, oxidation, and corrosion propertiescitations
- 2021Improved oxidation properties from a reduced B content in sputter-deposited TiBx thin filmscitations
- 2021Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiationcitations
- 2021Preparation and tunable optical properties of amorphous AlSiO thin filmscitations
- 2021Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heatingcitations
- 2021Systematic compositional analysis of sputter-deposited boron-containing thin filmscitations
- 2021The same chemical state of carbon gives rise to two peaks in X-ray photoelectron spectroscopycitations
- 2021Thermally induced structural evolution and age-hardening of polycrystalline V1-xMoxN (x approximate to 0.4) thin filmscitations
- 2020Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)N-x coatingscitations
- 2020X-ray photoelectron spectroscopy: Towards reliable binding energy referencingcitations
- 2020Oxidation behaviour of V2AlC MAX phase coatingscitations
- 2020Cobalt thin films as water-recombination electrocatalystscitations
- 2020Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)Nx filmscitations
- 2020Self-organized columnar Zr0.7Ta0.3B1.5 core/shell-nanostructure thin filmscitations
- 2020Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heatingcitations
- 2020Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Alcitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmospherecitations
- 2019A simple model for non-saturated reactive sputtering processescitations
- 2019Influence of Si doping and O-2 flow on arc-deposited (Al,Cr)(2)O-3 coatingscitations
- 2019Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound targetcitations
- 2019Effect of impurities on morphology, growth mode, and thermoelectric properties of (111) and (001) epitaxial-like ScN filmscitations
- 2019Control over the Phase Formation in Metastable Transition Metal Nitride Thin Films by Tuning the Al+ Subplantation Depthcitations
- 2019Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputteringcitations
- 2018Reliable determination of chemical state in x-ray photoelectron spectroscopy based on sample-work-function referencing to adventitious carbon: Resolving the myth of apparent constant binding energy of the C 1s peakcitations
- 2018Functionalization of bacterial cellulose wound dressings with the antimicrobial peptide epsilon-poly-L-Lysinecitations
- 2018Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputteringcitations
- 2018Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N-2citations
- 2018Effect of ion-implantation-induced defects and Mg dopants on the thermoelectric properties of ScNcitations
- 2018Enhanced Ti0.84Ta0.16N diffusion barriers, grown by a hybrid sputtering technique with no substrate heating, between Si(001) wafers and Cu overlayerscitations
- 2018Exploring NiO nanosize structures for ammonia sensingcitations
- 2018Reference binding energies of transition metal carbides by core-level x-ray photoelectron spectroscopy free from Ar+ etching artefactscitations
- 2017Ti2Au2C and Ti3Au2C2 formed by solid state reaction of gold with Ti2AlC and Ti3AlC2citations
- 2017Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layerscitations
- 2017Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Arcitations
- 2017C1s Peak of Adventitious Carbon Aligns to the Vacuum Level: Dire Consequences for Materials Bonding Assignment by Photoelectron Spectroscopycitations
- 2017Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiationcitations
- 2017Unprecedented Al supersaturation in single-phase rock salt structure VAlN films by Al+ subplantationcitations
- 2017Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Arcitations
- 2017Extended metastable Al solubility in cubic VAlN by metal-ion bombardment during pulsed magnetron sputtering: film stress vs subplantationcitations
- 2016Theoretical and experimental study of metastable solid solutions and phase stability within the immiscible Ag-Mo binary systemcitations
- 2016Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivitycitations
- 2016Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin filmscitations
- 2016Novel transparent Mg-Si-O-N thin films with high hardness and refractive indexcitations
- 2016Venting temperature determines surface chemistry of magnetron sputtered TiN filmscitations
- 2016In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopycitations
- 2015Novel hard, tough HfAlSiN multilayers, defined by alternating Si bond structure, deposited using modulated high-flux, low-energy ion irradiation of the growing filmcitations
- 2015Stoichiometric, epitaxial ZrB2 thin films with low oxygen-content deposited by magnetron sputtering from a compound target: Effects of deposition temperature and sputtering powercitations
- 2015Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS depositioncitations
- 2015Al capping layers for non-destructive x-ray photoelectron spectroscopy analyses of transition-metal nitride thin filmscitations
- 2015Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputteringcitations
- 2014A review of metal-ion-flux-controlled growth of metastable TiAlN by HIPIMS/DCMS co-sputteringcitations
- 2014X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96citations
- 2014Novel strategy for low-temperature, high-rate growth of dense, hard, and stress-free refractory ceramic thin filmscitations
- 2013Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin filmscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2012Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate biascitations
- 2012Selection of metal ion irradiation for controlling Ti1-xAlxN alloy growth via hybrid HIPIMS/magnetron co-sputteringcitations
- 2012Role of Tin+ and Aln+ ion irradiation (n=1, 2) during Ti1-xAlxN alloy film growth in a hybrid HIPIMS/magnetron modecitations
- 2011Ti-Si-C-N Thin Films Grown by Reactive Arc Evaporation from Ti3SiC2 Cathodescitations
- 2011CF(x) thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterizationcitations
- 2010Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N-2 atmospherescitations
- 2010Industrial-scale deposition of highly adherent CNx films on steel substratescitations
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