People | Locations | Statistics |
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Ferrari, A. |
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Schimpf, Christian |
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Dunser, M. |
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Thomas, Eric |
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Gecse, Zoltan |
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Tsrunchev, Peter |
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Della Ricca, Giuseppe |
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Cios, Grzegorz |
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Hohlmann, Marcus |
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Dudarev, A. |
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Mascagna, V. |
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Santimaria, Marco |
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Poudyal, Nabin |
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Piozzi, Antonella |
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Mørtsell, Eva Anne |
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Jin, S. |
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Noel, Cédric |
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Fino, Paolo |
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Mailley, Pascal |
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Meyer, Ernst |
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Zhang, Qi |
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Pfattner, Raphael | Brussels |
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Kooi, Bart J. |
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Babuji, Adara |
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Pauporte, Thierry |
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Ryssel, H.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2013Conduction mechanisms in thermal nitride and dry gate oxides grown on 4H-SiCcitations
- 2011Fluorine implantation for effective work function control in p-type metal-oxide-semiconductor high-k metal gate stackscitations
- 2011Germanium substrate loss during thermal processing ; Verlust an Germanium während der thermischen Prozessierungcitations
- 2009Properties of TaN thin films produced using PVD linear dynamic deposition techniquecitations
- 2009Gaussian distribution of inhomogeneous barrier height in tungsten/4H-SiC (000-1) Schottky diodes" ; Gaussförmige Verteilung von Inhomogenitäten bei Wolfram/4H-CiC (000`1) Schottky-Diodencitations
- 2008Recent improvements in the integration of field emitters into scanning probe microscopy sensors ; Barriereinhomogenitäten bei Wolfram-Schottky-Dioden auf 4H-SiCcitations
- 2007MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applicationscitations
- 2007MOCVD of hafnium silicate films obtained from a single-source precursor on silicon and germanium for gate-dielectric applicationscitations
- 2007UV nanoimprint materials: Surface energies, residual layers, and imprint quality ; UV Nanoimprint Materialien: Oberflächenenergie, Restlackdicke und Imprint-Qualitätcitations
- 2004Modeling of chemical-mechanical polishing on patterned wafers as part of integrated topography process simulation ; Modellierung des chemisch-mechanischen Polierens von strukturierten Wafern als Teil von integrierter Prozess-Simulationcitations
- 2004Optical characterization of ferroelectric Strontium-Bismuth-Tantalate (SBT) thin films ; Optische Charakterisierung ferroelektrischer SBT-Schichtencitations
- 2002HandMon-ISPM: Handling monitoring in a loading stations of a furnacescitations
- 2002Non-destructive characterization of strontium bismuth tantalate films ; Zerstörungsfreie Charakterisierung von SBT-Schichtencitations
- 2001Integrated metrology. An enabler for advanced process control (APC)citations
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