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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Liliental-Weber, Z.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (25/25 displayed)
- 2013Local structure of amorphous GaN1-xAsx semiconductor alloys across the composition rangecitations
- 2013Microstructure of Mg doped GaNAs alloyscitations
- 2012Wurtzite-to amorphous-to cubic phase transition of GaN1-x Asx alloys with increasing As contentcitations
- 2012Structural studies of GaN 1-x As x and GaN 1-x Bi x alloys for solar cell applicationscitations
- 2011Structural defects and cathodoluminescence of InxGa1-xN layerscitations
- 2011GaNAs alloys over the whole composition range grown on crystalline and amorphous substratescitations
- 2010Non-equilibrium GaNAs alloys with band gap ranging from 0.8-3.4 eVcitations
- 2010Molecular beam epitaxy of GaNAs alloys with high As content for potential photoanode applications in hydrogen productioncitations
- 2010Amorphous GaN1-xAsx alloys for multi-junction solar cells
- 2010Low gap amorphous GaN1-x Asx alloys grown on glass substratecitations
- 2009Structural perfection of InGaN layers and its relation to photoluminescencecitations
- 2009Highly mismatched crystalline and amorphous GaN1-x As x alloys in the whole composition rangecitations
- 2009Electrical and electrothermal transport in InNcitations
- 2009Spontaneous stratification of InGaN layers and its influence on optical propertiescitations
- 2008Energetic Beam Synthesis of Dilute Nitrides and Related Alloyscitations
- 2008Low-temperature grown compositionally graded InGaN filmscitations
- 2006Structure and electronic properties of InN and In-rich group III-nitride alloyscitations
- 2005Structural TEM study of nonpolar a-plane gallium nitride grown on (1120) 4H-SiC by organometallic vapor phase epitaxycitations
- 2005Transmission electron microscopy study of nonpolar a-plane GaN grown by pendeo-epitaxy on (11(2)under-bar0) 4H-SiC
- 2004Characterization and manipulation of exposed Ge nanocrystals
- 2003Diluted magnetic semiconductors formed by ion implantation and pulsed-laser meltingcitations
- 2003Growth and characterization of epitaxial GaN thin films on 4H-SiC (11.0) substrates
- 2003Synthesis of GaNxAs1-x thin films by pulsed laser melting and rapid thermal annealing of N+-implanted GaAscitations
- 2003Microstructure of nonpolar a-plane GaN grown on (1120) 4H-SiC investigated by TEM.
- 2002Transparent ZnO-based ohmic contact to p-GaNcitations
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document
Growth and characterization of epitaxial GaN thin films on 4H-SiC (11.0) substrates
Abstract
<p>GaN thin films were grown via metalorganic vapor phase epitaxy on a-plane 4H-SiC substrates on which had been deposited an AIN buffer layer. Atomic force microscopy images revealed that the microstructure of the AIN buffer layer and the subsequently deposited GaN had a highly oriented growth structure where parallel growth features propagated in the [1-1.0] direction. Scanning electron microscopy showed that the interfaces between the substrate, buffer layer, and epi-layer were continuous. Cracking was observed in GaN films having a thickness greater than 800 nm. Plan-view transmission electron microscopy analysis revealed stacking faults and threading dislocations with densities of similar to 1.6 x 10(6) cm(-1) and similar to3.3 x 10(10)cm(-1), respectively. X-ray diffraction confirmed that the GaN was deposited epitaxially in the same orientation as the substrate. The average on- and off-axis x-ray full-width half-maxima of the (11.0) and the (10.0) reflections were 948 arcsec and 5448 arcsec, respectively.</p>