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Marks, Harry
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article
Deposition and Characterisation of V₃Si films for SRF Applications
Abstract
A15 superconducting materials, like V₃Si and Nb₃Sn, are potential alternatives to Nb for next generation thin film SRF cavities when operated at 4 K. Their relatively high Tc and superconducting properties could allow for higher accelerating gradients and elevated operating temperatures. We present work on the deposition of V₃Si thin films on planar Cu substrates and an open structure 6 GHz cavity, using physical vapour deposition (PVD) and a V₃Si single target. The surface structure, composition and DC superconducting properties of two planar samples were characterised via secondary electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDX) and in a magnetic field penetration facility. Furthermore, the first deposition using PVD of a V₃Si film on a 6 GHz split cavity and the RF performance is presented.