• Brunkov, Pavel N.
• Reduto, Igor
• Svirko, Yuri
• Kamenskii, Aleksandr

Abstract

Formation of relief structures on the surface of thermally poled silicate glasses with reactive ion etching (RIE) is performed for the first time. RIE of a poled soda-lime glass is compared with acidic chemical etching of the glass by a polishing etchant. The chemical etching provides surface relief ∼20 times deeper than RIE, because the RIE selectively etches “silica-like” poled layer of the glass contrary to the acidic etching in which the poled glass layer behaves as a mask for the etching. However, the quality of the transfer of the anodic electrode relief pattern to glass surface by RIE is higher because the latter allows smoothing of peculiar stronger poled regions near the edges of the anodic electrode used in the glass poling. In manufacturing structures, which elements are hundreds of nanometers in size, RIE is preferable over the chemical etching because of its directivity. Additional thermal treatment of the poled glasses allowed increasing of the surface relief formed by RIE ∼ 230% and by chemical etching ∼ 140% due to the relaxation of the poled region of the glass.

Topics

• impedance spectroscopy
• surface
• glass
• glass
• lime
• polishing
• plasma etching