| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Szabo, Peter
Technical University of Denmark
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (28/28 displayed)
- 2020Effect of Crystallinity on Water Vapor Sorption, Diffusion, and Permeation of PLA-Based Nanocompositescitations
- 2020Effect of Crystallinity on Water Vapor Sorption, Diffusion, and Permeation of PLA-Based Nanocompositescitations
- 2019Impact of thermal processing or solvent casting upon crystallization of PLA nanocellulose and/or nanoclay compositescitations
- 2018Modelling of rheological properties in polystyrene with long-chain branching
- 2016Hybrid poly(lactic acid)/nanocellulose/nanoclay composites with synergistically enhanced barrier properties and improved thermomechanical resistancecitations
- 2016Hybrid poly(lactic acid)/nanocellulose/nanoclay composites with synergistically enhanced barrier properties and improved thermomechanical resistancecitations
- 2016A comparison of partially acetylated nanocellulose, nanocrystalline cellulose, and nanoclay as fillers for high-performance polylactide nanocompositescitations
- 2015Enhancement of dielectric permittivity by incorporating PDMS-PEG multiblock copolymers in silicone elastomerscitations
- 2015Enhancement of dielectric permittivity by incorporating PDMS-PEG multiblock copolymers in silicone elastomerscitations
- 2015Microthrix parvicella abundance associates with activated sludge settling velocity and rheology - Quantifying and modelling filamentous bulkingcitations
- 2015Nanocellulose fibers applied in PLA composites for food packaging applications
- 2015Enhancing relative permittivity by incorporating PDMS-PEG multi block copolymers in binary polymer blends
- 2015Enhancing relative permittivity by incorporating PDMS-PEG multi block copolymers in binary polymer blends
- 2015Enhancing relative permittivity by incorporating PDMS-PEG multiblock copolymers in binary polymer blends
- 2015Enhancing relative permittivity by incorporating PDMS-PEG multiblock copolymers in binary polymer blends
- 2015A soft and conductive PDMS-PEG block copolymer as a compliant electrode for dielectric elastomers
- 2015Improving dielectric permittivity by incorporating PDMS-PEG block copolymer into PDMS network
- 2015Improving dielectric permittivity by incorporating PDMS-PEG block copolymer into PDMS network
- 2014Properties of slurries made of fast pyrolysis oil and char or beech woodcitations
- 2014Improving dielectric permittivity by incorporating PDMS-PEG block copolymer into PDMS network
- 2014Improving dielectric permittivity by incorporating PDMS-PEG block copolymer into PDMS network
- 2012Constant force extensional rheometry of polymer solutionscitations
- 2007Computational modeling of concrete flow:General overviewcitations
- 2005Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithographycitations
- 2005An Investigation on Rheology of Peroxide Cross-linking of Low Density Polyethylene
- 2004Nanoimprint lithography in the cyclic olefin copolymer, Topas, a highly ultraviolet-transparent and chemically resistant thermoplastcitations
- 2004Axi-Symmetric Simulation of the Slump Flow Test for Self-Compacting
- 2003Rheological behaviour of polyethylene with peroxide crosslinking agent. Ismaeil Ghasemi, Peter Szabo and Henrik Koblitz Rasmussen
Places of action
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article
Nanoimprint lithography in the cyclic olefin copolymer, Topas, a highly ultraviolet-transparent and chemically resistant thermoplast
Abstract
Thermal nanoimprint lithography (NIL) of the cyclic olefin copolymeric thermoplast Topas® isdemonstrated. Topas® is highly UV-transparent, has low water absorption, and is chemically resistant to hydrolysis, acids and organic polar solvents which makes it suitable for lab-on-a-chipapplications. In particular, Topas® is suitable for micro systems made for optical bio-detection since waveguides for UV-light can be made directly in Topas®. In this article full process sequences for spin coating Topas® onto 4 in. silicon wafers, NIL silicon stamp fabrication with micro and nanometer sized features, and the NIL process parameters are presented. The rheological propertiesof Topas® are measured and the zero shear rate viscosity is found to be 2.16x10<sup>4</sup> Pa s at 170 °C and3.6x10<sup>3</sup> Pa s at 200 °C while the dominant relaxation time is found to be 4.4 s and 0.9 s,respectively. The etch resistance of Topas® to two different reactive ion etch processes, an oxygenplasma, and an anisotropic silicon etch, is found to be 12.6 nm/s and 0.7 nm/s, respectively. The etch rates are compared to the similar etch rates of 950 k PMMA, cross-linked SU-8, and standard AZ5214E photoresist. Finally, UV-lithography (UVL) followed by metal deposition and lift-off ontop of a Topas® film patterned by NIL is demonstrated. This exploits the chemical resistance ofTopas® to sodium hydroxide and acetone. The demonstrated UVL and lift-off on top of an imprinted Topas® film opens new possibilities for post-NIL processing.