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Arranz, M. A.
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article
Magnetic Kondo scattering in the electrical resistivity of sputtered Ti–Co films
Abstract
<jats:p>We have investigated the influence of the granular microstructure in the electrical resistivity of RF-sputtered Ti100−xCox thin films. Their x-rays characterization has been correlated with dc resistivity measurements from 7 to 300 K. A minimum in the resistivity, ρ(T), centered around Tm∼50 K, was recorded for Ti93Co7 samples grown at 30 W. Contrarily, samples grown at 110 W and the same x value displayed no evidences of that low-temperature anomaly. This phenomenon correlated with the change of the majority Ti granular phase: hcp-Ti for the sample grown at 30 W and bcc-Ti for the 110 W sample. That minimum arises from the great difference in Co solubility into both Ti granular phases (0.8 at. % in hcp-Ti and 14.5 at. % in bcc-Ti). Hence, the very small quantity of Co diluted into the hcp-Ti grains allows us to consider Co particles as uncorrelated magnetic impurities which scatter the conduction electrons. This magnetic Kondo scattering would be the mechanism responsible for the observed minimum in the resistivity of Ti93Co7 samples grown at 30 W.</jats:p>