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Rubio-Gimenez, Victor
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article
Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films
Abstract
Robust and scalable thin-film deposition<br/>methods are key to realize the potential of metal-organic<br/>frameworks (MOFs) in electronic devices. Here, we report<br/>the first integration of the chemical vapor deposition (CVD)<br/>of MOF coatings in a custom reactor within a cleanroom<br/>setting. As a test case, the MOF-CVD conditions for<br/>the zeolitic imidazolate framework-8 are optimized to enable<br/>smooth, pinhole-free, and uniform thin films on full 200 mm<br/>wafers under mild conditions. The single-chamber MOF-CVD<br/>process and the impact of the deposition parameters are<br/>elucidated via a combination of in situ monitoring and ex situ<br/>characterization. The resulting process guidelines will pave the<br/>way for new MOF-CVD formulations and a plethora of MOF based devices.