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| Naji, M. |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Kočí, Jan | Prague |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Ballage, Charles
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Publications (6/6 displayed)
- 2024Vapor chemical composition in Electron Beam Powder Bed Fusion using Ti-6Al-4V powder
- 2023Spatiotemporal characterization of evaporated atoms during electron beam melting additive manufacturing by advanced laser diagnosticscitations
- 2023The Use of Sacrificial Graphite-like Coating to Improve Fusion Efficiency of Copper in Selective Laser Meltingcitations
- 2022Saturation pressure of nonequilibrium titanium evaporation during additive manufacturing by electron powder bed fusioncitations
- 2022Saturation pressure of nonequilibrium titanium evaporation during additive manufacturing by electron powder bed fusioncitations
- 2020Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on coppercitations
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article
Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper
Abstract
International audience ; Amorphous carbon-based coatings deposited on copper substrates by magnetron sputtering at different target to -substrate distances were investigated. Films deposited at short distances as 2 cm presented the best results in terms of morphology, density, and resistivity. Ultraviolet near-infrared range spectrometry measurements determined total reflectance and ellipsometry, extinction coefficient, refraction index, and pseudo bandgap. Amorphous carbon films of 150 nm deposited at 2 cm reduced the total reflectance by up to 60 ± 5% in the near-in-fra-red range when compared to pure copper films. The addition of Fe*boosts the absorption of the coating reducing the total reflectance by up to 70 ± 5% in near-infrared. (Fe*: deposited from stainless-steel target used in direct-current magnetron sputtering). Also, it reduces the electrical resistivity by a factor of 100 compared to that of pure amorphous carbon films. The reduction in total reflectance induced by the presence of the amorphous carbon-based films on copper depends, as expected, on light penetration depth and the absorption coefficient.