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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Haddad, Paul
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Publications (7/7 displayed)
- 2018Evaluation of a cooling/heating-assisted microextraction instrument using a needle trap device packed with aminosilica/graphene oxide nanocomposites, covalently attached to cottoncitations
- 2018Synthesis and characterization of MIL-101(Cr) intercalated by polyaniline composite, doped with silica nanoparticles and its evaluation as an efficient solid-phase extraction sorbentcitations
- 2016Open tubular-capillary electrochromatography: developments and applications from 2013 to 2015citations
- 2010Photolithographic patterning of conducting polyaniline films via flash weldingcitations
- 2010Cyano bonded silica monolith - development of an in situ modification method for analytical scale columnscitations
- 2009Profiling the chemical composition of explosives
- 2001New isoelectric buffers for capillary electrophoresis: N-carboxymethylated polyethyleneimine as a macromolecular isoelectric buffercitations
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article
Photolithographic patterning of conducting polyaniline films via flash welding
Abstract
In this work, two significant advances in photolithographic patterning of polyaniline (PANI) films are reported. Firstly, flash welding was enhanced through the use of polymeric substrates, enabling complete penetration of the welding of PANI films with thicknesses ranging from 5 to over 14 I?m, significantly thicker than reported previously. Masking of parts of the PANI films during flash welding enabled the formation of adjacent conducting and insulating regions as the welding changes the electrical properties of the film. Raman spectroscopy was used to determine the sharpness of these edges, and indicated that the interface between the flash welded and masked regions of the PANI films was typically less than 15 I?m wide. Secondly, using longpass filters, light with a wavelength less than 570 nm was found not to contribute to the welding process. This was confirmed by the use of a 635 nm laser diode for welding the PANI films. This novel approach enabled patterning of PANI films using a direct writing technique with a narrow wavelength light source. A? 2010 Elsevier B.V. All rights reserved.