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Lang, S.
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article
Correlation between fracture characteristics and valence electron concentration of sputtered Hf-C-N based thin films
Abstract
<p>Hard protective coating materials based on transition metal nitrides and carbides typically suffer from limited fracture tolerance. To further tune these properties non-metal alloying – substituting C with N – has been proven favorable for magnetron sputtered Hf-C-N based thin films. A theoretically predicted increase in valence electron concentration (from 8.0 to 9.0 e/f.u. from Hf[sbnd]C to Hf[sbnd]N) through nitrogen alloying lead to an increase in fracture toughness (K<sub>IC</sub> obtained during in-situ SEM cantilever bending) from 1.89 ± 0.15 to 2.33 ± 0.18 MPa·m<sup>1/2</sup> for Hf<sub>0.43</sub>C<sub>0.57</sub> to Hf<sub>0.35</sub>C<sub>0.30</sub>N<sub>0.35</sub>, respectively. The hardness remains close to the super-hard regime with values of 37.8 ± 2.1 to 39.9 ± 2.7 GPa for these specific compositions. Already the addition of small amounts of nitrogen, while sputtering a ceramic Hf[sbnd]C target, leads to a drastic increase of nitrogen on the non-metallic sublattice for fcc single phased structured HfC<sub>1-x</sub>N<sub>x</sub> films, where x = N/(C + N). The here obtained results also provide experimental proof for the correlation between fracture characteristics and valence electron concentration.</p>