Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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Materials Map under construction

The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (5/5 displayed)

  • 2024Advancing Neutron Detection: Fabrication, Characterization, and Performance Evaluation of Self‐Powered PIN BGaN/GaN Superlattice‐Based Neutron Detectors1citations
  • 2023Multiple Shapes Micro‐LEDs with Defect Free Sidewalls and Simple Liftoff and Transfer Using Selective Area Growth on Hexagonal Boron Nitride Template11citations
  • 2022Influence of Sapphire Substrate Orientation on the van der Waals Epitaxy of III-Nitrides on 2D Hexagonal Boron Nitride: Implication for Optoelectronic Devices14citations
  • 2021What if spiders made metamaterial webs using materials with mechanical size-effects?citations
  • 2021Electrochemical Investigation of Cathodic Deposition of Mo Coating from Oxofluoride Molten Salt and Characterizationcitations

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Chart of shared publication
Li, Xiaohang
1 / 3 shared
Sundaram, Suresh
3 / 11 shared
Karrakchou, Soufiane
1 / 1 shared
Halfaya, Yacine
1 / 3 shared
Vuong, Phuong
3 / 7 shared
Salvestrini, Jean Paul
1 / 1 shared
Gautier, Simon
3 / 5 shared
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Voss, Paul, L.
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Ngo, Thi Huong
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Sama, Yves, N.
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Patriarche, Gilles
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Salvestrini, Jean-Paul
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Largeau, Ludovic
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Vashisth, Aniruddh
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Behling, Eric Robert
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Glaesener, Raphaël
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Kumar, Siddhant
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Srivastava, Charu
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Ghosh, Soumyajit
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Varshney, Jalaj
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Co-Authors (by relevance)

  • Li, Xiaohang
  • Sundaram, Suresh
  • Karrakchou, Soufiane
  • Halfaya, Yacine
  • Vuong, Phuong
  • Salvestrini, Jean Paul
  • Gautier, Simon
  • Ottapilakkal, Vishnu
  • Voss, Paul, L.
  • Mballo, Adama
  • Ougazzaden, Abdallah
  • Kumar, Mritunjay
  • Moudakir, Tarik
  • Gujrati, Rajat
  • Ngo, Thi Huong
  • Sama, Yves, N.
  • Patriarche, Gilles
  • Salvestrini, Jean-Paul
  • Largeau, Ludovic
  • Vashisth, Aniruddh
  • Behling, Eric Robert
  • Glaesener, Raphaël
  • Kumar, Siddhant
  • Srivastava, Charu
  • Ghosh, Soumyajit
  • Varshney, Jalaj
OrganizationsLocationPeople

article

Multiple Shapes Micro‐LEDs with Defect Free Sidewalls and Simple Liftoff and Transfer Using Selective Area Growth on Hexagonal Boron Nitride Template

  • Sundaram, Suresh
  • Moudakir, Tarik
  • Gujrati, Rajat
  • Ngo, Thi Huong
  • Sama, Yves, N.
  • Vuong, Phuong
  • Gautier, Simon
  • Ottapilakkal, Vishnu
  • Patriarche, Gilles
  • Salvestrini, Jean-Paul
  • Srivastava, Ashutosh
  • Voss, Paul, L.
  • Ougazzaden, Abdallah
Abstract

International audience ; Several technological challenges have prevented GaN‐based micro‐LEDs from finding application in mass market displays, despite their unique properties such as very high brightness and the very fast response time of GaN‐based materials. The primary challenges are the cost and complexity of lift‐off and transfer of LEDs from sapphire substrates to suitable supports as well as the lowered performance of tiny micro‐LEDs caused by chemical etching that defines individual LEDs. Herein, this work reports demonstration of a complete process that solves these challenges with epitaxy and cleanroom technologies that are commercially available. The process begins with van der Waals epitaxy of 2D h‐BN on silica masks with square, triangular and hexagonal patterns on sapphire substrates which define the micro‐LED regions. Then selective area growth of MQW LED heterostructures, with ultra smooth crystalline sidewalls, down to ultra tiny size of 1.4 µm is performed. Because of the lack of vertical chemical bonds in the h‐BN layer, simple mechanical lift‐off and transfer is performed on an array of LEDs heterostructures down to size of 8 µm. Finally, transparent ITO p‐contacts are deposited on LEDs with uniform lift‐off, resulting in high brightness LEDs.

Topics
  • impedance spectroscopy
  • nitride
  • etching
  • defect
  • Boron