Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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Topics

Publications (92/92 displayed)

  • 2024Strain as a Global Factor in Stabilizing the Ferroelectric Properties of ZrO₂22citations
  • 2024Strain as a Global Factor in Stabilizing the Ferroelectric Properties of ZrO<sub>2</sub>22citations
  • 2024High Gain Graphene Based Hot Electron Transistor with Record High Saturated Output Current Density3citations
  • 2023Strain as a global factor in stabilizing the ferroelectric properties of ZrO 222citations
  • 2023Engineering of HZO layer for the fabrication of ultimate 3D vertical transistors for Memory-in-Logic applications M. Materials engineering for advanced semiconductor devicescitations
  • 2023Influence of the Ozone Dose Time during Atomic Layer Deposition on the Ferroelectric and Pyroelectric Properties of 45 nm-Thick ZrO2 Films14citations
  • 2023From Ferroelectric Material Optimization to Neuromorphic Devices104citations
  • 2023Influence of the ozone dose time during atomic layer deposition on the ferroelectric and pyroelectric properties of 45 nm-thick ZrO 2 films14citations
  • 2023Reducing the tunneling barrier thickness of bilayer ferroelectric tunnel junctions with metallic electrodes6citations
  • 2023Modulation Doping of Silicon Nanowires to Tune the Contact Properties of Nano-Scale Schottky Barriers5citations
  • 2023Toward Nonvolatile Spin-Orbit Devices6citations
  • 2022Physics-based modeling of a bi-layer Al₂O₃/Nb₂O₅ analog memristive device.2citations
  • 2022Optimizing nucleation layers for the integration of ferroelectric HZO on CVD-grown graphenecitations
  • 2022An Analog Memristive and Memcapacitive Device for Neuromorphic Computing2citations
  • 2022Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia-Zirconia Thin Films28citations
  • 2022Graph Coloring via Locally-Active Memristor Oscillatory Networks22citations
  • 2022Unleashing the Potential of Integrated Ferroelectric Devices with Hafnium Oxide3citations
  • 2022In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride7citations
  • 2022MOx in ferroelectric memoriescitations
  • 2022Assessment of Back-End-of-Line Compatibility of Sputtered HfO2-Based Ferroelectrics10citations
  • 2022Influence of Si-Doping on 45 nm Thick Ferroelectric ZrO2 Films23citations
  • 2022Oxygen vacancy concentration as a function of cycling and polarization state in TiN/Hf 0.5 Zr 0.5 O 2 /TiN ferroelectric capacitors studied by x-ray photoemission electron microscopy30citations
  • 2022Pushing Sputtered HfO2-Based Ferroelectrics toward BEOL Compatibility2citations
  • 2022Raman Spectroscopy as a Key Method to Distinguish the Ferroelectric Orthorhombic Phase in Thin ZrO2-Based Films27citations
  • 2021Single-step reactive ion etching process for device integration of hafnium-zirconium-oxide (HZO)/titanium nitride (TiN) stacks3citations
  • 2021Controlled Silicidation of Silicon Nanowires Using Flash Lamp Annealing11citations
  • 2021Reliability aspects of ferroelectric hafnium oxide for application in non-volatile memories18citations
  • 2021Chemical Stability of IrO$_{2}$ Top Electrodes in Ferroelectric Hf$_{0.5}$Zr$_{0.5}$O$_{2}$ ‐Based Metal–Insulator–Metal Structures: The Impact of Annealing Gas15citations
  • 2021Surface Preconditioning and Postmetallization Anneal Improving Interface Properties and Vth Stability under Positive Gate Bias Stress in AlGaN/GaN MIS-HEMTs13citations
  • 2021Impact of vacancies and impurities on ferroelectricity in PVD- and ALD-grown HfO$_2$ films61citations
  • 2020Magnetic and ferroelectric memories2citations
  • 2020Material investigations for improving stability of Au free Ta/Al-based ohmic contacts annealed at low temperature for AlGaN/GaN heterostructures7citations
  • 2020Enhanced ferroelectric polarization in TiN/HfO2/TiN capacitors by interface design42citations
  • 2020Influence of oxygen content on the structure and reliability of ferroelectric HfxZr1−xO2 layers96citations
  • 2020Enhanced Ferroelectric Polarization in TiN/HfO$_{2}$/TiN Capacitors by Interface Design42citations
  • 2019Local structural investigation of hafnia-zirconia polymorphs in powders and thin films by X-ray absorption spectroscopy20citations
  • 2019Multi-staged deposition of trench-gate oxides for power MOSFETs3citations
  • 2019Extraction of the active acceptor concentration in (pseudo-) vertical GaN MOSFETs using the body-bias effect7citations
  • 2019Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium74citations
  • 2019Ferroelectric field effect transistor7citations
  • 2019Recent progress for obtaining the ferroelectric phase in hafnium oxide based films74citations
  • 2019Uniting The Trinity of Ferroelectric HfO₂ Memory Devices in a Single Memory Cell25citations
  • 2019Uniting the trinity of ferroelectric HfO2 memory devices in a single memory cell25citations
  • 2018Review and perspective on ferroelectric HfO₂-based thin films for memory applications465citations
  • 2018Effect of Annealing Ferroelectric HfO₂ Thin Films: In Situ, High Temperature X-Ray Diffraction111citations
  • 2018Origin of Temperature-Dependent Ferroelectricity in SiDoped HfO₂85citations
  • 2018Gating Hysteresis as an Indicator for Silicon Nanowire FET Biosensors21citations
  • 2018Hafnium oxide based ferroelectric devices for memories and beyond8citations
  • 2018Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors281citations
  • 2018Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO₂144citations
  • 2018Al-, Y-, and La-doping effects favoring intrinsic and field induced ferroelectricity in HfO₂: a first principles study121citations
  • 2017Human alpha-thrombin detection platform using aptamers on a silicon nanowire field-effect transistorcitations
  • 2017In-depth electrical characterization of carrier transport in ambipolar Si-NW Schottky-barrier FETs5citations
  • 2016Printable Parallel Arrays of Si Nanowire Schottky-Barrier-FETs With Tunable Polarity for Complementary Logic30citations
  • 2016Compact Nanowire Sensors Probe Microdroplets44citations
  • 2016An Energy-Efficient, BiFeO3-Coated Capacitive Switch with Integrated Memory and Demodulation Functions20citations
  • 2016Sulphur sensitive galvanic cells for the float glass processcitations
  • 2015Flexible Electronics: Light Weight and Flexible High-Performance Diagnostic Platform (Adv. Healthcare Mater. 10/2015)1citations
  • 2015Scaling and Graphical Transport-Map Analysis of Ambipolar Schottky-Barrier Thin-Film Transistors Based on a Parallel Array of Si Nanowires36citations
  • 2015Ultra-thin ZrO2/SrO/ZrO2 insulating stacks for future dynamic random access memory capacitor applications19citations
  • 2015Optoelectronic switching of nanowire-based hybrid organic/oxide/semiconductor field-effect transistors35citations
  • 2015Effect of the stoichiometry of niobium oxide on the resistive switching of Nb2O5 based metal-insulator-metal stacks15citations
  • 2015Energy monitoring of high dose ion implantation in semiconductors via photocurrent measurementcitations
  • 2015Via hole conditioning in silicon heterojunction metal wrap through solar cellscitations
  • 2014Bipolar electric-field enhanced trapping and detrapping of mobile donors in BiFeO3 memristors96citations
  • 2014Ionic effects on the transport characteristics of nanowire-based FETs in a liquid environment11citations
  • 2014Conduction mechanisms and breakdown characteristics of Al2O 3-doped ZrO2 high-k dielectrics for three-dimensional stacked metal-insulator-metal capacitors36citations
  • 2014Near surface inversion layer recombination in Al2O3 passivated n -type silicon16citations
  • 2014Atomic layer deposited high-κ nanolaminates for silicon surface passivation25citations
  • 2013Forming-free resistive switching in multiferroic BiFeO3 thin films with enhanced nanoscale shunts54citations
  • 2013Millisecond flash lamp annealing for LaLuO3 and LaScO 3 high-k dielectrics8citations
  • 2013Parallel arrays of Schottky barrier nanowire field effect transistors: Nanoscopic effects for macroscopic current output55citations
  • 2013Channel length dependent sensor response of Schottky-barrier FET pH sensors4citations
  • 2013Sponge-like Si-SiO2 nanocomposite - Morphology studies of spinodally decomposed silicon-rich oxide14citations
  • 2013Structural and dielectric properties of sputtered SrxZr (1-x)Oy4citations
  • 2013Silicon nanowires - a versatile technology platform70citations
  • 2012Thermally activated crystallization of Nb 2O 5 grown on Pt electrode9citations
  • 2012Incipient ferroelectricity in Al-doped HfO2 thin films773citations
  • 2011Macroscopic and microscopic electrical characterizations of high-k ZrO 2 and ZrO2/Al2O3/ZrO2 metal-insulator-metal structures11citations
  • 2011Applicability of molecular beam deposition for the growth of high-k oxides5citations
  • 2011Optical characterization of three-dimensional structures within a DRAM capacitorcitations
  • 2011Control of rectifying and resistive switching behavior in BiFeO3 thin films26citations
  • 2011Reduced leakage current in BiFeO3 thin films with rectifying contacts43citations
  • 2011Multiscale modeling of nanowire-based Schottky-barrier field-effect transistors for sensor applications14citations
  • 2011Analysis of the effect of germanium preamorphization on interface defects and leakage current for high-k metal-oxide-semiconductor field-effect transistor1citations
  • 2010Nanocrystalline materials - Optimization of thin film propertiescitations
  • 2003SrBi2Ta2O9 ferroelectric thin film capacitors23citations
  • 2003Alkali- and hydrogen ion sensing properties of LPCVD silicon oxynitride thin films10citations
  • 2002Influence of deposition conditions on Ir/IrO 2 oxygen barrier effectiveness34citations
  • 2002Platinum contamination issues in ferroelectric memories6citations
  • 2001Thickness dependent morphology and electrical characteristics of SrBi 2Ta2O9 deposited by metal organic decomposition1citations
  • 2001An overview of FeRAM technology for high density applicationscitations

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Kastner, Marcus J.
1 / 1 shared
Hartner, Walter
2 / 2 shared
Dehm, Christine
2 / 2 shared
Moert, Manfred
1 / 1 shared
Pinnow, Cay Uwe
1 / 1 shared
Mazure, Carlos
1 / 1 shared
Kasko, Igor
1 / 1 shared
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Co-Authors (by relevance)

  • Kiguchi, Takanori
  • Richter, Claudia
  • Lomenzo, Patrick D.
  • Reinig, Peter
  • Fancher, Chris M.
  • Schenk, Tony
  • Starschich, Sergej
  • Berg, Fenja
  • Xu, Bohan
  • Schroeder, Uwe Paul
  • Boettger, Ulrich
  • Holsgrove, Kristina M.
  • Kersch, Alfred
  • Holsgrove, Kristina
  • Lomenzo, Patrick
  • Schroeder, Uwe
  • Knaut, Martin
  • Chavarin, Carlos A.
  • Strobel, Carsten
  • Völkel, Sandra
  • Hiess, Andre
  • Wenger, Christian
  • Albert, Matthias
  • Max, Benjamin
  • Kirchner, Robert
  • Mathieu, Fabrice
  • Trommer, Jens
  • Moustakas, Konstantinos
  • Neckel, Bruno
  • Larrieu, Guilhem
  • Lecestre, Aurélie
  • Collins, Liam
  • Park, Min Hyuk
  • Begon-Lours, Laura
  • Slesazeck, Stefan
  • Driussi, Francesco
  • Esseni, David
  • Silva, Claudia
  • Segatto, Mattia
  • Lancaster, Suzanne
  • Nagarajan, Soundarya
  • König, Dirk
  • Ratschinski, Ingmar
  • Smith, Sean C.
  • Hiller, Daniel
  • Guedeja-Marrón, Alejandra
  • Guerrero, Ruben
  • Varela, Maria
  • Gärtner, Jan
  • Camarero, Julio
  • Gudín, Adrian
  • Perna, Paolo
  • Anadón, Alberto
  • Diez, Jose Manuel
  • Arnay, Iciar
  • Ascoli, Alon
  • Tetzlaff, Ronald
  • Schroedter, Richard
  • Mgeladze, Eter
  • Herzig, Melanie
  • Gudin, Adrian
  • Lee, Younghwan
  • Hsain, Hanan Alexandra
  • Jones, Jacob L.
  • Alcala, Ruben
  • Parsons, Gregory N.
  • Materano, Monica
  • Weiher, Martin
  • Schroeder, U.
  • Slesazeck, S.
  • Bartha, Johann W.
  • Reif, Johanna
  • Killge, Sebastian
  • Mulaosmanovic, Halid
  • Hoffmann, Michael
  • Wang, Xuetao
  • Grube, Matthias
  • Mehmood, Furqan
  • Mentes, Tevfik Onur
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  • Hamouda, Wassim
  • Barrett, Nick
  • Deluca, Marco
  • Popov, Maxim
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  • Pohl, Darius
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  • Heinzig, André
  • Georgiev, Yordan M.
  • Khan, Muhammad Bilal
  • Rebohle, Lars
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  • Mueller, Martina
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  • Diez, Liza Herrera
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  • Falkowski, Max
  • Zhou, Chuanzhen
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  • Jahn, A.
  • Großer, A.
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  • Pregl, Sebastian
  • Ibarlucea, Bergoi
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  • Weber, Walter M.
  • Schröder, Uwe
  • Lebeau, James M.
  • Grimley, Everett D.
  • Materlik, Robin
  • Künneth, Christopher
  • Opitz, Joerg
  • Zoergiebel, Felix
  • Roemhildt, Lotta
  • Jeon, Dae-Young
  • Baldauf, Tim
  • Park, So Jeong
  • Heinzig, Andre
  • Schuett, Julian
  • Nozaki, Daijiro
  • Illing, Rico
  • Schmidt, Heidemarie
  • Schmidt, Oliver G.
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  • Bürger, Danilo
  • You, Tiangui
  • Du, Nan
  • Skorupa, Ilona
  • Selvaraj, Laveen Prabhu
  • Zeng, Huizhong
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  • Lang, Hans Jürgen
  • Tomandl, Gerhard
  • Rank, Jürgen
  • Schreiber, Gerhard
  • Makarov, Denys
  • Lin, Gungun
  • Lee, Sanghun
  • Karnaushenko, Daniil
  • Melzer, Michael
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  • Lim, Hanjin
  • Afanasev, Valeri V.
  • Knebel, Steve
  • Muehle, Uwe
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  • Klemm, V.
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  • Dani, Ines
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  • Simon, Daniel K.
  • Jordan, Paul M.
  • Rebenklau, Lars
  • Schilling, Niels
  • Dirnstorfer, Ingo
  • Volz, Kerstin
  • Abendroth, Barbara
  • Stöcker, Hartmut
  • Li, Guodong
  • Beyer, Andreas
  • Kunstmann, Jens
  • Zhou, Dayu
  • Krautheim, Gunter
  • Benner, Frank
  • Kögler, Reinhard
  • Ou, Xin
  • Shuai, Yao
  • Fiedler, Jan
  • Facsko, Stefan
  • Reuther, Helfried
  • Zhou, Shengqiang
  • Helm, Manfred
  • Siles, Pablo F.
  • Borany, J. V.
  • Skorupa, W.
  • Hübner, R.
  • Mantl, S.
  • Schubert, J.
  • Lehmann, J.
  • Schäfer, A.
  • Weber, Walter
  • Friedrich, D.
  • Schmidt, B.
  • Liedke, B.
  • Mücklich, A.
  • Kölling, S.
  • Heinig, K. H.
  • Wolf, D.
  • Riechert, Henning
  • Martin, Dominik
  • Berger, L.
  • Riedel, Stefan
  • Singh, Aarti
  • Sundqvist, Jonas
  • Mueller, Stefan
  • Wilde, Lutz
  • Erben, Elke
  • Müller, Johannes
  • Weinreich, Wenke
  • Heitmann, Johannes
  • Bierwagen, Oliver
  • Geelhaar, Lutz
  • Klude, Matthias
  • Hecht, Thomas
  • Kasic, Alexander
  • Krupinski, Martin
  • Zhang, Wanli
  • Wu, Chuangui
  • Streit, Stephan
  • Zörgiebel, F.
  • Kunstmann, J.
  • Nozaki, D.
  • Weber, W. M.
  • Jakschik, S.
  • Goldbach, M.
  • Roll, G.
  • Frey, L.
  • Hartner, W.
  • Bacchofer, H.
  • Schroeder, H.
  • Dehm, C.
  • Schindler, G.
  • Wendt, H.
  • Waser, R.
  • Bosk, P.
  • Mört, M.
  • Shin, Paik Kyun
  • Poppa, S.
  • Hösler, W.
  • Pinnow, C. U.
  • Geyer, U.
  • Seibt, M.
  • Nagel, N.
  • Kasko, I.
  • Samwer, K.
  • Jahnel, F.
  • Bleyl, F.
  • Pamler, W.
  • Höpfner, J.
  • Ryssel, H.
  • Boubekeur, H.
  • Kohlstedt, Hermann
  • Nagel, Nicolas
  • Waser, Rainer
  • Mört, Manfred
  • Schindler, Gïnther
  • Kastner, Marcus J.
  • Hartner, Walter
  • Dehm, Christine
  • Moert, Manfred
  • Pinnow, Cay Uwe
  • Mazure, Carlos
  • Kasko, Igor
OrganizationsLocationPeople

document

From Ferroelectric Material Optimization to Neuromorphic Devices

  • Park, Min Hyuk
  • Mikolajick, Thomas
  • Begon-Lours, Laura
  • Slesazeck, Stefan
Abstract

<p>Due to the voltage driven switching at low to moderate voltages combined with a nonvolatile behavior of the achieved polarization state, ferroelectric materials have a unique potential for a wide class of low power nonvolatile electronic devices. However, for many years, the competitivity of such devices was hindered by the compatibility issues of well-known ferroelectric materials based on perovskite crystals with established complementary metal oxide semiconductor technology. The discovery of ferroelectricity in hafnium oxide and related materials changed this situation and opened up a path towards scalable ferroelectric devices. The natural application of any nonvolatile device is as a memory cell in nonvolatile memories. However, the nonvolatile memory devices also built the basis for other applications like in-memory computing, nonvolatile logic or neuromorphic devices. Based on the readout mechanism three different basic ferroelectric devices can be constructed: ferroelectric capacitors, ferroelectric field effect transistors and ferroelectric tunneling junctions. In this article after an introduction first the material science of the ferroelectricity in hafnium oxide and related materials will be summarized with a special focus on tailoring the switching characteristics towards different nonvolatile applications. A summary of the current status of nonvolatile semiconductor memories using the three fundamental device architectures then lays the ground for looking into applications like in-memory computing or nonvolatile logic were the separation between memory function and switching function can be overcome. Finally a special focus will be given to showcase how the basic building blocks of spiking neural networks, the neuron and the synapse, can be realized using the basic ferroelectric devices and how they can be combined to realize neuromorphic computing systems. A summary, comparison with other technologies like resistive switching devices and finally an outlook complete the paper. This article is protected by copyright. All rights reserved.</p>

Topics
  • perovskite
  • impedance spectroscopy
  • semiconductor
  • hafnium
  • hafnium oxide