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Naber, W. J. M.
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Publications (5/5 displayed)
- 2011Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayerscitations
- 2010A photoemission study of interfaces between organic semiconductors and Co as well as Al2O3/Co contactscitations
- 2010Controlled tunnel-coupled ferromagnetic electrodes for spin injection in organic single-crystal transistorscitations
- 2009Low-temperature solution synthesis of chemically functional ferromagnetic FePtAu nanoparticlescitations
- 2007Organic spintronicscitations
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article
Local Doping of Silicon Using Nanoimprint Lithography and Molecular Monolayers
Abstract
Micrometer-scale monolayer patterns of a phosphorus-containing molecular precursor are fabricated on nearly intrinsic Si(100) using nanoimprint lithography. The patterned sample is protected by a SiO2capping layer applied by electron beam evaporation and subjected to rapid thermal annealing (RTA) to diffuse the phosphorus dopant atoms into the bulk silicon locally.