| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Schmitt, Paul
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2023Heterostructure Films of SiO 2 and HfO 2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Depositioncitations
- 2023Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Depositioncitations
- 2023Linear and Nonlinear Optical Properties of Iridium Nanoparticles Grown via Atomic Layer Depositioncitations
- 2022Linear and Nonlinear Optical Properties of Iridium Nanoparticles by Atomic Layer deposition
- 2022Environmentally stable iridium mirror coatings for the infrared spectral range
- 2022Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrorscitations
- 2022Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrorscitations
- 2021Influence of substrate materials on nucleation and properties of iridium thin films grown by ALDcitations
- 2020Atomic Layer Depositioncitations
- 2018Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygencitations
Places of action
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booksection
Atomic Layer Deposition
Abstract
Atomic layer deposition (ALD) is a key coating technology which enables conformal coatings on high aspect ratio substrates. In addition, it allows for a precise thickness control of thin films, multilayers, and nanolaminates. It is a chemical coating technology where the precursors are introduced sequentially in the reactor or are spatially separated. Herein, basic principles of ALD are introduced, reactor geometries are overviewed, and typical ALD materials and applications are summarized. ALD thin films are one pillar of modern computer technologies where ultra‐thin, conformal coatings with exceptional physical, electrical, and chemical properties are essential. Numerous emerging applications have been demonstrated and some are already in mass‐production. Precursor and process development, tool design and engineering, extensive thin‐film optimization, the search for better materials and composites combined with expert knowledge in the application fields have led to this success.